Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.38 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | CES2 | O00748 | 2/20 | 0.35 |
| ▸ | CES1 | P23141 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3211097 | 0.91 | DNM1 (0.40) | LTA4HCES2CES1SMN1; SMN2SIGMAR1 | |
| SCHEMBL3199450 | 0.91 | DNM1 (0.40) | LTA4HCES2CES1SMN1; SMN2SIGMAR1 | |
| Acetic Acid SCHEMBL10401642 | 0.87 | CES2 (0.43) | CES2CES1TP53TDP1TSHR | |
| SCHEMBL11301243 | 0.87 | DNM1 (0.35) | CES2CES1SMN1; SMN2TP53TSHR | |
| SCHEMBL4237944 | 0.85 | TP53 (0.38) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL9188295 | 0.83 | DNM1 (0.38) | LTA4HCES2CES1SMN1; SMN2SIGMAR1 | |
| Hydrochloric Acid SCHEMBL3838831 | 0.81 | MEN1 (0.40) | LTA4HCES2CES1SMN1; SMN2SIGMAR1 | |
| SCHEMBL1481192 | 0.81 | LTA4H (0.38) | LTA4HPCSK9PTGS2CES2CES1 | |
| SCHEMBL31461090 | 0.79 | ESR1 (0.47) | LTA4HPTGS2SMN1; SMN2ESR1TP53 | |
| SCHEMBL12412382 | 0.79 | LTA4H (0.36) | LTA4HPCSK9PTGS2CES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| EP-2771740-B1 | PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD | CANON KK (JP) | 2017-03-15 | — | — | EP | disclosed |
| US-9268222-B2 | Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head | CANON KABUSHIKI KAISHA (JP) | 2016-02-23 | — | — | US | disclosed |
| US-8975003-B2 | Photosensitive negative resin composition | CANON KABUSHIKI KAISHA (JP) | 2015-03-10 | — | — | US | disclosed |
| US-20140329175-A1 | PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD | CANON KABUSHIKI KAISHA (JP) | 2014-11-06 | — | — | US | disclosed |
| US-8853441-B2 | Sulfonium compound, photoacid generator, and resist composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2014-10-07 | — | — | US | disclosed |
| US-20130235119-A1 | PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-7927780-B2 | Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-19 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7862980-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| WO-2009040107-A2 | METHOD FOR THE PRODUCTION OF METAL-CONTAINING NANOPARTICLES | ALBERT-LUDWIGS-UNIVERSITÄT FREIBURG (DE) | 2009-04-02 | — | — | WO | disclosed |
| US-20090068591-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | LTA4H 2800/4885PCSK9 3281/4885PTGS2 2275/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | LTA4H 1470/4885PCSK9 3579/4885PTGS2 3684/4885 |
| US-20090068591-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, AND ACID GENERATOR | RER1, C1R, ABCC1 | LTA4H 3534/4885PCSK9 3048/4885PTGS2 3894/4885 |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, HCN1, NHERF1 | LTA4H 2644/4885PCSK9 2135/4885PTGS2 2972/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | LTA4H 4272/4885PCSK9 4526/4885PTGS2 4007/4885 |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | CRY1, ASIC1, ASIC3 | LTA4H 3327/4885PCSK9 4214/4885PTGS2 1706/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | LTA4H 4311/4885PCSK9 4613/4885PTGS2 4008/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.