Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSV | O60911 | 2/20 | 0.40 |
| ▸ | CTSL | P07711 | 2/20 | 0.40 |
| ▸ | CTSS | P25774 | 2/20 | 0.40 |
| ▸ | CTSK | P43235 | 2/20 | 0.40 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.37 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.37 |
| ▸ | TAS1R3 | Q7RTX0 | 3/20 | 0.36 |
| ▸ | TAS1R1 | Q7RTX1 | 3/20 | 0.36 |
| ▸ | IDO1 | P14902 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.35 |
| ▸ | CD38 | P28907 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12416484 | 0.78 | FFAR1 (0.45) | CTSVCTSLCTSSCTSKFFAR1 | |
| SCHEMBL2193202 | 0.77 | IDO1 (0.39) | ALDH1A1TAS1R3TAS1R1IDO1POLB | |
| SCHEMBL13126080 | 0.76 | TSHR (0.37) | ALDH1A1POLBNPSR1KDM4EMEN1 | |
| SCHEMBL14825876 | 0.72 | HSP90AA1 (0.35) | — | |
| SCHEMBL15958400 | 0.71 | CXCR5 (0.39) | ALDH1A1KDM4E | |
| SCHEMBL2740688 | 0.71 | CTSV (0.49) | CTSVCTSLCTSSCTSKFFAR1 | |
| SCHEMBL14088212 | 0.71 | FFAR1 (0.47) | CTSVCTSLCTSSCTSKFFAR1 | |
| SCHEMBL14749067 | 0.69 | SCN1A (0.37) | ALDH1A1KDM4E | |
| SCHEMBL9610702 | 0.68 | IDO1 (0.44) | CTSVCTSLCTSSCTSKFFAR1 | |
| SCHEMBL19335512 | 0.68 | IDO1 (0.50) | CTSVCTSLCTSSCTSKFFAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8501384-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-06 | — | — | US | disclosed |
| US-20110171580-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-14 | — | — | US | disclosed |