SCHEMBL1242013

SCHEMBL1242013

CCCCC(CCC)OC(=O)C(O)CC(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 7/20 0.43
CTSK P43235 1/20 0.42
CYP1A2 P05177 3/20 0.38
FFAR1 O14842 1/20 0.38
MAPK1 P28482 4/20 0.37
GMNN O75496 3/20 0.37
LMNA P02545 3/20 0.37
MAPT P10636 3/20 0.37
NPSR1 Q6W5P4 3/20 0.37
MEN1 O00255 2/20 0.37
HSP90AA1 P07900 2/20 0.37
BLM P54132 2/20 0.37
KMT2A Q03164 2/20 0.37
NR1H4 Q96RI1 2/20 0.37
TP53 P04637 1/20 0.37
CYP2C9 P11712 1/20 0.37
TSHR P16473 1/20 0.37
HIF1A Q16665 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
GLA P06280 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6374127 0.90 GPR84 (0.56) GPR84CYP1A2FFAR1MAPK1GMNN
SCHEMBL2231103 0.90 GPR84 (0.56) GPR84CYP1A2FFAR1MAPK1GMNN
SCHEMBL23361766 0.90 GPR84 (0.56) GPR84CYP1A2FFAR1MAPK1GMNN
SCHEMBL9784116 0.90 GPR84 (0.56) GPR84CYP1A2FFAR1MAPK1GMNN
SCHEMBL2231280 0.86 PRKCA (0.40) GPR84CYP1A2FFAR1MAPK1GMNN
SCHEMBL25182618 0.85 GPR84 (0.50) GPR84CYP1A2FFAR1MAPK1GMNN
SCHEMBL28164462 0.84 CTSK (0.45) GPR84CTSKMAPK1TSHRCA1
SCHEMBL10534358 0.82 FFAR1 (0.50) GPR84CYP1A2FFAR1GMNNLMNA
SCHEMBL2926353 0.82 FFAR1 (0.50) GPR84CYP1A2FFAR1GMNNLMNA
Malic Acid SCHEMBL29249135 0.82 SMN1; SMN2 (0.48) GPR84CYP1A2FFAR1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8874019-B2 Image forming method KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2014-10-28 US claimed
US-20130202336-A1 IMAGE FORMING METHOD KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-08-08 US claimed
CN-108601955-A For making hair shape or changing the composition and method of hair shape 欧莱雅 2018-09-28 CN disclosed
CN-107750153-A For handling the composition and method of hair 欧莱雅 2018-03-02 CN disclosed
CN-105517715-A Aerosol containing emulsion deodorant, equipped with hollow dispensing head L'OREAL S A 2016-04-20 CN disclosed
CN-105358255-A Anhydrous deodorant aerosol equipped with hollow dispensing head OREAL 2016-02-24 CN disclosed
US-8874019-B2 Image forming method KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2014-10-28 US disclosed
EP-2343341-B1 POLYORGANOSILOXANE COMPOSITION AND CURED PRODUCT THEREOF UNIV MIE (JP) 2014-08-27 EP disclosed
EP-2762976-A1 Use of immersion liquids AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-08-06 EP disclosed
EP-1557721-B1 Use of fluids for immersion lithography and pattern forming method AIR PROD & CHEM (US) 2014-08-06 EP disclosed
EP-2636692-A1 CURABLE URETHANE COMPOSITION, CURED PRODUCT THEREOF, KIT AND CURRED PRODUCT PRODUCTION METHOD Mie University (JP) 2013-09-11 EP disclosed
US-20130202336-A1 IMAGE FORMING METHOD KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-08-08 US disclosed
US-8455593-B2 Polyorganosiloxane composition and cured production thereof MIE UNIVERSITY (JP) 2013-06-04 US disclosed
US-20110207864-A1 POLYORGANOSILOXANE COMPOSITION AND CURED PRODUCTION THEREOF MIE UNIVERSITY (JP) 2011-08-25 US disclosed
EP-2343341-A1 POLYORGANOSILOXANE COMPOSITION AND CURED PRODUCT THEREOF Mie University (JP) 2011-07-13 EP disclosed
US-7879531-B2 Immersion lithography fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2011-02-01 US disclosed
US-20050173682-A1 carrier medium and at least one additive such as alkyl polyglycoside, alkyl alcohol, or various ethylene oxide adducts; use at an operating wavelength ranging from 140 nm to 365 nm AIR PRODUCTS AND CHEMICALS, INC. 2005-08-11 US disclosed
EP-1557721-A2 Immersion lithography fluids AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-07-27 EP disclosed