SCHEMBL12424043

SCHEMBL12424043

COB(OC)c1ccccc1N

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.44
TDP1 Q9NUW8 3/20 0.44
ADRA2B P18089 1/20 0.44
PTGS1 P23219 1/20 0.44
CYP3A4 P08684 3/20 0.41
ALOX15 P16050 2/20 0.41
CASP1 P29466 1/20 0.41
CASP7 P55210 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
KEAP1 Q14145 1/20 0.39
CFTR P13569 1/20 0.38
HSD17B10 Q99714 1/20 0.38
ENPP2 Q13822 1/20 0.37
ADRA2C P18825 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
ORAI1 Q96D31 1/20 0.35
ORAI2 Q96SN7 1/20 0.35
ORAI3 Q9BRQ5 1/20 0.35
TSHR P16473 3/20 0.35
PIK3CA P42336 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24161928 0.79 ENPP2 (0.45) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
SCHEMBL28360418 0.78 CYP3A4 (0.43) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
SCHEMBL28620104 0.76 CYP3A4 (0.41) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
Hydrochloric Acid SCHEMBL28507710 0.76 CYP3A4 (0.41) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
Water SCHEMBL28854478 0.76 CYP3A4 (0.41) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
SCHEMBL20312366 0.76 CYP3A4 (0.36) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
SCHEMBL911112 0.73 TSHR (0.43) ALDH1A1TDP1CYP3A4SMN1; SMN2ENPP2
SCHEMBL13215265 0.72 CYP3A4 (0.47) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
SCHEMBL29780861 0.72 CYP3A4 (0.47) ALDH1A1TDP1ADRA2BPTGS1CYP3A4
SCHEMBL56105 0.72 CYP3A4 (0.47) ALDH1A1TDP1ADRA2BPTGS1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10504732-B2 Impurity diffusion agent composition and method for manufacturing semiconductor substrate TOKYO OHKA KOGYO CO, LTD. (JP) 2019-12-10 US disclosed
US-20180182624-A1 IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2018-06-28 US disclosed
US-20180182624-A1 IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2018-06-28 US disclosed
US-7977363-B2 Fungicides/bactericides for plant protection; exhibit a strong fortifying effect in plants; for controlling cereal diseases against Puccinia species, and diseases in viticulture and fruit and vegetable production against Botrytis, Venturia or Alternaria species; low toxicity; tolrerance BAYER CROPSCIENCE AG (DE) 2011-07-12 US disclosed
US-7868179-B2 Thiazolyl biphenyl amides BAYER CROPSCIENCE AG (DE) 2011-01-11 US disclosed
US-20100029730-A1 THIAZOLYL BIPHENYL AMIDES BAYER INTELLECTUAL PROPERTY GMBH (DE) 2010-02-04 US disclosed
US-20080242708-A1 Biphenyl-Thiazolo-Carboxamides BAYER CROPSCIENCE AG (DE) 2008-10-02 US disclosed
US-7388097-B2 Difluoromethyl thiazolyl carboxanilides BAYER CROPSCIENCE AG (DE) 2008-06-17 US disclosed
US-7186862-B2 Microbicidal agents on the basis of biphenylbenzamide derivatives BAYER CROPSCIENCE AG (DE) 2007-03-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100029730-A1 THIAZOLYL BIPHENYL AMIDES MRPL21, FOXM1, TTL ALDH1A1 422/4885TDP1 1443/4885ADRA2B 908/4885
US-20180182624-A1 IMPURITY DIFFUSION AGENT COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE SLC43A1, SAMHD1, SNRPD2 ALDH1A1 2704/4885TDP1 943/4885ADRA2B 3140/4885
US-20080242708-A1 Biphenyl-Thiazolo-Carboxamides MRPL21, CBR3, NAT1 ALDH1A1 123/4885TDP1 1934/4885ADRA2B 955/4885
US-10504732-B2 Impurity diffusion agent composition and method for manufacturing semiconductor substrate SLC43A1, SAMHD1, SNRPD2 ALDH1A1 2704/4885TDP1 943/4885ADRA2B 3140/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.