SCHEMBL1245606

SCHEMBL1245606

CC(=CCCOC(=O)CCCl)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 1/20 0.33
ADRA1A P35348 1/20 0.33
MAPT P10636 1/20 0.32
BLM P54132 1/20 0.32
CD81 P60033 1/20 0.32
DGKA P23743 1/20 0.32
PPARG P37231 1/20 0.31
ALOX15 P16050 1/20 0.30
BACE1 P56817 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1245603 1.00 ADRA2A (0.33) ADRA2AADRA1AMAPTBLMCD81
SCHEMBL17363355 0.89 ADRA2A (0.42) ADRA2AADRA1AMAPTBLMCD81
SCHEMBL11520488 0.86 CD81 (0.33) CD81PPARGALOX15
SCHEMBL4942900 0.86 CD81 (0.33) CD81PPARGALOX15
SCHEMBL4178740 0.84 ADRA2A (0.34) ADRA2AADRA1AMAPTBLMCD81
SCHEMBL4178735 0.84 ADRA2A (0.34) ADRA2AADRA1AMAPTBLMCD81
SCHEMBL6131136 0.84 LMNA (0.39) ADRA2AADRA1AMAPTBLMCD81
SCHEMBL28742803 0.80 NAAA (0.42) BLMCD81DGKAPPARGALOX15
SCHEMBL3404601 0.79 DGKA (0.43) DGKAALOX15TDP1
SCHEMBL36409 0.79 MGAM (0.40) CD81PPARGALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8273463-B2 Multilayer film for plating, method of manufacturing metal film-coated material and metal film-coated material FUJIFILM CORPORATION (JP) 2012-09-25 US disclosed
US-8187664-B2 Metallic pattern forming method, metallic pattern obtained thereby, printed wiring board using the same, and TFT wiring board using the same FUJIFILM CORPORATION (JP) 2012-05-29 US disclosed
US-7879535-B2 A fine conductive metal pattern superior in heat resistance, adhesion property to a base surface and durability on a polyimide surface; simplification; grafting an acylic monomer on polyimide to interact with electroless plating catalyst; reduction of metal salt in defined pattern; printed circuit FUJIFILM CORPORATION (JP) 2011-02-01 US disclosed
US-20090269599-A1 MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
US-20090022885-A1 METALLIC PATTERN FORMING METHOD, METALLIC PATTERN OBTAINED THEREBY, PRINTED WIRING BOARD USING THE SAME, AND TFT WIRING BOARD USING THE SAME FUJIFILM CORPORATION (JP) 2009-01-22 US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 WO disclosed
US-20050214693-A1 Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material FUJI PHOTO FILM CO., LTD. 2005-09-29 US disclosed
US-6919158-B2 Conductive pattern material and method for forming conductive pattern FUJI PHOTO FILM CO., LTD. (JP) 2005-07-19 US disclosed
US-20030068581-A1 Conductive pattern material and method for forming conductive pattern FUJIFILM CORPORATION (JP) 2003-04-10 US disclosed
EP-1282175-A2 Conductive pattern material and method for forming conductive pattern FUJI PHOTO FILM CO., LTD. (JP) 2003-02-05 EP disclosed