Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 3/20 | 0.49 |
| ▸ | KDM1A | O60341 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.37 |
| ▸ | ESR1 | P03372 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MAPKAPK2 | P49137 | 2/20 | 0.35 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.34 |
| ▸ | PPARG | P37231 | 1/20 | 0.34 |
| ▸ | PPARA | Q07869 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | OGA | O60502 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12228673 | 0.84 | ELANE (0.66) | ELANEKDM1AKMT2AMAPTLMNA | |
| SCHEMBL12923422 | 0.82 | ELANE (0.58) | ELANEKDM1AKMT2AMAPTALDH1A1 | |
| SCHEMBL795426 | 0.79 | ELANE (0.58) | ELANEKDM1AKMT2AMAPTALDH1A1 | |
| SCHEMBL12556799 | 0.77 | PSEN1 (0.44) | KMT2ASMN1; SMN2MAPTALDH1A1LMNA | |
| SCHEMBL794937 | 0.75 | ELANE (0.50) | ELANEKDM1AKMT2AALDH1A1LMNA | |
| SCHEMBL4061370 | 0.74 | ELANE (0.81) | ELANEKDM1AKMT2AMAPTLMNA | |
| SCHEMBL5701486 | 0.72 | ELANE (0.57) | ELANEKDM1AKMT2AHIF1AESR1 | |
| SCHEMBL9128684 | 0.71 | ELANE (0.70) | ELANEKDM1AKMT2AHIF1AESR1 | |
| SCHEMBL1788209 | 0.70 | ELANE (0.64) | ELANEKDM1AKMT2ASMN1; SMN2ALDH1A1 | |
| SCHEMBL3954536 | 0.70 | ELANE (0.54) | ELANEKMT2AHIF1AESR1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9523911-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound | JSR CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9188858-B2 | Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound | JSR CORPORATION (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9152044-B2 | — | — | 2015-10-06 | — | — | US | disclosed |
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9104102-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-08-11 | — | — | US | disclosed |
| US-20140342288-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | JSR CORPORATION (JP) | 2014-11-20 | — | — | US | disclosed |
| US-8889335-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889888-B2 | Sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889336-B2 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-20130295505-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130260316-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-09-19 | — | — | US | disclosed |
| US-20130183624-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| US-20130177848-A1 | Polymer, Resist Material Containing Same, and Method for Forming Pattern Using Same | CENTRAL GLASS COMPANY LIMITED (JP) | 2013-07-11 | — | — | US | disclosed |
| US-20130078579-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND | JSR CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20120295198-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130244185-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, RXRG | ELANE 980/4885KDM1A 2717/4885KMT2A 4267/4885 |
| US-20130065186-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT | GLRA3, RER1, FPR3 | ELANE 981/4885KDM1A 2771/4885KMT2A 4261/4885 |
| US-20130078579-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND | RER1, RAD51, RFT1 | ELANE 863/4885KDM1A 1214/4885KMT2A 3143/4885 |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | ASIC1, FGFR1, PFAS | ELANE 4527/4885KDM1A 940/4885KMT2A 910/4885 |
| US-20170038679-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND | RER1, ASIC1, GAR1 | ELANE 1499/4885KDM1A 1032/4885KMT2A 2060/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.