Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.31 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | TTR | P02766 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL647836 | 0.81 | CA4 (0.36) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL647415 | 0.81 | CA4 (0.36) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL705542 | 0.79 | CA4 (0.35) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL4079890 | 0.78 | LTA4H (0.32) | LTA4H | |
| SCHEMBL703898 | 0.77 | CA4 (0.33) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL4079195 | 0.77 | CA4 (0.33) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL27996306 | 0.77 | CA4 (0.35) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL4076791 | 0.77 | TRPA1 (0.33) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL15912070 | 0.77 | ESR1 (0.35) | CA4ESR1ESR2LTA4HPOLB | |
| SCHEMBL646824 | 0.77 | CA4 (0.33) | CA4ESR1ESR2LTA4HPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1746122-B1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2013-06-12 | — | — | EP | disclosed |
| EP-1705207-B1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR CORP (JP) | 2012-10-24 | — | — | EP | disclosed |
| US-8268403-B2 | Curing a coating of a siloxane compound and a carbosilane compound using ultraviolet radiation; a low relative dielectric constant, excellent chemical resistance, plasma resistance, mechanical strength | JSR CORPORATION (JP) | 2012-09-18 | — | — | US | disclosed |
| EP-1981074-B1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORP (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-7893538-B2 | Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device | JSR CORPORATION (JP) | 2011-02-22 | — | — | US | disclosed |
| US-20100007025-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-7528207-B2 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2009-05-05 | — | — | US | disclosed |
| US-20080268264-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| EP-1981074-A1 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE | JSR Corporation (JP) | 2008-10-15 | — | — | EP | disclosed |
| US-20080038527-A1 | Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070021580-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1746122-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1746123-A1 | METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION | JSR Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-20070015892-A1 | Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film | JSR CORPORATION (JP) | 2007-01-18 | — | — | US | disclosed |
| EP-1705206-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1705207-A1 | METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM | JSR Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |