SCHEMBL127764

SCHEMBL127764

C[Si](C)(O[Si](CCCN)(c1ccccc1)c1ccccc1)O[Si](CCCN)(c1ccccc1)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 2/20 0.37
HTR2A P28223 1/20 0.37
MAOA P21397 1/20 0.34
KIF11 P52732 3/20 0.32
KCNH2 Q12809 1/20 0.32
TAAR1 Q96RJ0 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5475785 0.95 MAOA (0.37) HRH1HTR2AMAOAKIF11KCNH2
SCHEMBL12634222 0.94 HTR2A (0.33) HRH1HTR2AMAOATAAR1
SCHEMBL126332 0.89 HTR2A (0.42) HRH1HTR2AMAOAKIF11KCNH2
SCHEMBL9706777 0.88 MAOA (0.31) HRH1HTR2AMAOA
SCHEMBL13829447 0.88 HRH1 (0.36) HRH1HTR2AMAOAKIF11KCNH2
SCHEMBL3418590 0.88 HRH1 (0.36) HRH1HTR2AMAOAKIF11KCNH2
SCHEMBL26017954 0.85 HTR2A (0.30) HRH1HTR2A
SCHEMBL13100638 0.82 HTR2A (0.33) HRH1HTR2AMAOA
SCHEMBL24433793 0.81 KIF11 (0.37) HRH1HTR2AMAOAKIF11KCNH2
SCHEMBL12695267 0.79 MAOA (0.32) HRH1HTR2AMAOAKIF11KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2949719-B1 ADHESIVE COMPOSITION TORAY INDUSTRIES (JP) 2022-11-09 EP claimed
US-20240381529-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG RESONAC CORPORATION (JP) 2024-11-14 US disclosed
US-20230331946-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE RESONAC CORPORATION (JP) 2023-10-19 US disclosed
WO-2023042305-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND APPLICATION FOR PREPREG 株式会社レゾナック 2023-03-23 WO disclosed
EP-2949719-B1 ADHESIVE COMPOSITION TORAY INDUSTRIES (JP) 2022-11-09 EP disclosed
US-20220289976-A1 THERMOSETTING RESIN COMPOSITION, THERMOSETTING RESIN SHEET, ELECTRONIC COMPONENT, AND ELECTRONIC DEVICE TORAY INDUSTRIES, INC. (JP) 2022-09-15 US disclosed
WO-2022059716-A1 METHOD FOR MANUFACTURING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGE 昭和電工マテリアルズ株式会社 2022-03-24 WO disclosed
WO-2022059167-A1 METHOD FOR PRODUCING SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGES, PREPREG, AND SUBSTRATE MATERIAL FOR SEMICONDUCTOR PACKAGES 昭和電工マテリアルズ株式会社 2022-03-24 WO disclosed
US-20220019146-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-01-20 US disclosed
US-20210278767-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-09-09 US disclosed
US-20070169886-A1 Heat-resistant resin laminated film, multilayer film with metal layer including same and semiconductor device TORAY INDUSTRIES, INC. (JP) 2007-07-26 US disclosed
EP-1788380-A1 METHOD OF ESTIMATING DISSOLUTION RATE OF POLYIMIDE, PROCESS FOR PRODUCING POLYIMIDE AND POLYIMIDE OBTAINED USING THE METHODS HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-05-23 EP disclosed
US-20070098995-A1 Adhesive film and process for preparing the same as well as adhesive sheet and semiconductor device HITACHI CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
EP-1721740-A1 HEAT-RESISTANT RESIN LAMINATED FILM, MULTILAYER FILM WITH METAL LAYER INCLUDING SAME, AND SEMICONDUCTOR DEVICE TORAY INDUSTRIES, INC. (JP) 2006-11-15 EP disclosed
EP-1407879-A1 HEAT-RESISTANT RESIN FILM WITH METAL LAYER AND WIRING BOARD AND METHOD FOR MANUFACTURING THEM TORAY INDUSTRIES, INC. (JP) 2004-04-14 EP disclosed
US-20030170431-A1 Heat-resistant resin film with metal layer and wiring board, and method for manufacturing them TORAY INDUSTRIES, INC. (JP) 2003-09-11 US disclosed
EP-0510638-B1 Silicon-modified polyimide film and process for producing same CHISSO CORP (JP) 1995-10-11 EP disclosed
US-5300364-A Metal-clad laminates and method for producing same CHISSO CORPORATION (JP) 1994-04-05 US disclosed
EP-0510638-A1 Silicon-modified polyimide film and process for producing same CHISSO CORPORATION (JP) 1992-10-28 EP disclosed
EP-0496334-A1 A flexible base laminated with metal on both the surfaces and a process for producing same CHISSO CORPORATION (JP) 1992-07-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220019146-A1 FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN LIPA, MLLT3, EPB41L2 HRH1 4239/4885HTR2A 1078/4885MAOA 1238/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.