SCHEMBL12965355

SCHEMBL12965355

CC(CC(CC(C)c1ccc(O)cc1)c1ccccc1)C(=O)OC(C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 4/20 0.38
LMNA P02545 1/20 0.38
HSD17B10 Q99714 1/20 0.38
RIPK1 Q13546 1/20 0.37
CTSS P25774 1/20 0.37
CTSK P43235 1/20 0.37
IDO1 P14902 1/20 0.36
TDO2 P48775 1/20 0.36
ESRRB O95718 1/20 0.36
NPSR1 Q6W5P4 4/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
PKM P14618 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
MAPT P10636 3/20 0.35
MAPK1 P28482 2/20 0.35
RECQL P46063 2/20 0.35
POLB P06746 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14066976 0.89 NQO2 (0.35) LMNAESR1ESR2
SCHEMBL1617663 0.89 LMNA (0.43) LMNAHSD17B10CTSSCTSKIDO1
SCHEMBL26374288 0.87 LMNA (0.39) TRPA1LMNAHSD17B10RIPK1CTSS
SCHEMBL14067005 0.87 ESR1 (0.42) MAPK1ESR1ESR2
SCHEMBL23434091 0.83 MEN1 (0.43) LMNACTSSCTSKCYP1A2CYP2D6
SCHEMBL14067025 0.83 ELANE (0.45) TRPA1RIPK1CTSSCTSKPRKCA
SCHEMBL825660 0.83 ESR1 (0.44) LMNAHSD17B10CYP1A2CYP2D6MAPT
SCHEMBL23418220 0.82 TRPA1 (0.40) TRPA1LMNAHSD17B10RIPK1CTSS
SCHEMBL2736414 0.82 LMNA (0.39) TRPA1LMNAHSD17B10RIPK1CTSK
SCHEMBL14062409 0.81 ATM (0.39) LMNAHSD17B10CTSSCTSKESRRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230384670-A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-30 US disclosed
US-20230384675-A1 UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-11-30 US disclosed
US-20140193752-A1 STABILIZED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-07-10 US disclosed
US-20140193752-A1 STABILIZED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2014-07-10 US disclosed
WO-2012135286-A2 STABILIZED ACID AMPLIFIERS THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 2012-10-04 WO disclosed
US-20080220597-A1 Photoresists and methods for use thereof ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-09-11 US disclosed
US-7297616-B2 Methods, photoresists and substrates for ion-implant lithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-11-20 US disclosed