Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDCD1 | Q15116 | 1/20 | 0.34 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.31 |
| ▸ | PDE4A | P27815 | 1/20 | 0.30 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.30 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.30 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13027339 | 0.86 | MAPT (0.30) | MAPT | |
| SCHEMBL15672365 | 0.86 | PDCD1 (0.33) | PDCD1CD274MAPTAKR1B1 | |
| SCHEMBL13027245 | 0.83 | ADRA2A (0.31) | — | |
| SCHEMBL13027122 | 0.75 | PDCD1 (0.36) | PDCD1CD274MAPTKDM4EALDH1A1 | |
| SCHEMBL13027288 | 0.74 | ALDH1A1 (0.36) | MAPTALDH1A1 | |
| SCHEMBL13027241 | 0.73 | AGXT (0.34) | MAPTALDH1A1 | |
| SCHEMBL13027249 | 0.73 | ALDH1A1 (0.32) | MAPTALDH1A1 | |
| SCHEMBL17616016 | 0.72 | CA2 (0.39) | PDCD1CD274MAPTKDM4EALDH1A1 | |
| SCHEMBL13027257 | 0.71 | ALDH1A1 (0.34) | MAPTKDM4EALDH1A1 | |
| SCHEMBL13027225 | 0.71 | CYP1A2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8697330-B2 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20100285407-A1 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |