Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KAT8 | Q9H7Z6 | 10/20 | 0.63 |
| ▸ | EP300 | Q09472 | 10/20 | 0.58 |
| ▸ | MEN1 | O00255 | 4/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.57 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.49 |
| ▸ | FNTA | P49354 | 1/20 | 0.48 |
| ▸ | FNTB | P49356 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | MAPT | P10636 | 3/20 | 0.48 |
| ▸ | POLB | P06746 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | USP2 | O75604 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.48 |
| ▸ | UBA2 | Q9UBT2 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12522408 | 1.00 | KAT8 (0.63) | KAT8EP300MEN1KMT2AGPR55 | |
| SCHEMBL12451614 | 0.91 | KAT8 (0.53) | KAT8EP300MEN1KMT2AGPR55 | |
| SCHEMBL420805 | 0.89 | MAPT (0.60) | KAT8MEN1KMT2AALDH1A1MAPT | |
| SCHEMBL445744 | 0.89 | MAPT (0.60) | KAT8MEN1KMT2AALDH1A1MAPT | |
| SCHEMBL8116198 | 0.89 | MAPT (0.60) | KAT8MEN1KMT2AALDH1A1MAPT | |
| SCHEMBL12522411 | 0.87 | KAT8 (0.53) | KAT8EP300MEN1KMT2AGPR55 | |
| SCHEMBL13092688 | 0.87 | KAT8 (0.53) | KAT8EP300MEN1KMT2AGPR55 | |
| SCHEMBL12270482 | 0.87 | KAT8 (0.53) | KAT8EP300MEN1KMT2AGPR55 | |
| SCHEMBL13377579 | 0.87 | KAT8 (0.58) | KAT8EP300MEN1KMT2AGPR55 | |
| SCHEMBL278669 | 0.86 | KAT8 (0.51) | KAT8EP300MEN1KMT2AGPR55 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11667564-B2 | Method of manufacturing an etched glass article | AGFA-GEVAERT NV (BE) | 2023-06-06 | — | — | US | disclosed |
| US-11667564-B2 | Method of manufacturing an etched glass article | AGFA-GEVAERT NV (BE) | 2023-06-06 | — | — | US | disclosed |
| US-20210017068-A1 | METHOD OF MANUFACTURING AN ETCHED GLASS ARTICLE | AGFA-GEVAERT NV (BE) | 2021-01-21 | — | — | US | disclosed |
| US-10662532-B2 | Methods of manufacturing embossing elements | AGFA-GEVAERT N.V. (BE) | 2020-05-26 | — | — | US | disclosed |
| EP-3201277-B1 | DIGITAL FABRICATION OF METALLIC ARTICLES | AGFA GEVAERT (BE) | 2019-02-20 | — | — | EP | disclosed |
| US-20190031558-A1 | METHOD OF MANUFACTURING AN ETCHED GLASS ARTICLE | AGFA-GEVAERT NV (BE) | 2019-01-31 | — | — | US | disclosed |
| US-10039193-B2 | Etch-resistant inkjet inks for manufacturing conductive patterns | AGFA-GEVAERT (BE) | 2018-07-31 | — | — | US | disclosed |
| US-10039193-B2 | Etch-resistant inkjet inks for manufacturing conductive patterns | AGFA-GEVAERT (BE) | 2018-07-31 | — | — | US | disclosed |
| US-9938420-B2 | Digital fabrication of metallic articles | AGFA-GEVAERT (BE) | 2018-04-10 | — | — | US | disclosed |
| US-9938420-B2 | Digital fabrication of metallic articles | AGFA-GEVAERT (BE) | 2018-04-10 | — | — | US | disclosed |
| US-7303863-B2 | Silver halide emulsion and silver halide photographic light-sensitive material | FUJIFILM CORPORATION (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7244551-B2 | Silver halide color photosensitive material | FUJIFILM CORPORATION (JP) | 2007-07-17 | — | — | US | disclosed |
| US-7229750-B2 | Silver halide emulsion and silver halide photographic light-sensitive material | FUJIFILM CORPORATION (JP) | 2007-06-12 | — | — | US | disclosed |
| US-7229750-B2 | Silver halide emulsion and silver halide photographic light-sensitive material | FUJIFILM CORPORATION (JP) | 2007-06-12 | — | — | US | disclosed |
| US-20070077527-A1 | Silver halide color photosensitive material | FUJI PHOTO FILM CO., LTD. | 2007-04-05 | — | — | US | disclosed |
| US-20070077527-A1 | Silver halide color photosensitive material | FUJI PHOTO FILM CO., LTD. | 2007-04-05 | — | — | US | disclosed |
| US-7196194-B2 | Dye-forming coupler, silver halide photographic light-sensitive material and azomethine dye compound | FUJI PHOTO FILM CO., LTD (JP) | 2007-03-27 | — | — | US | disclosed |
| US-7196194-B2 | Dye-forming coupler, silver halide photographic light-sensitive material and azomethine dye compound | FUJI PHOTO FILM CO., LTD (JP) | 2007-03-27 | — | — | US | disclosed |
| US-20070054224-A1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2007-03-08 | — | — | US | disclosed |
| US-20070054224-A1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. | 2007-03-08 | — | — | US | disclosed |