SCHEMBL1310366

SCHEMBL1310366

COC(OC)N1C(=O)NC2NC(=O)NC21

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.41
ABL1 P00519 2/20 0.41
RIN1 Q13671 2/20 0.41
MAPT P10636 1/20 0.41
KDM4E B2RXH2 1/20 0.34
KMT2A Q03164 1/20 0.34
PKM P14618 1/20 0.33
SIRT5 Q9NXA8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16859552 0.79 TDP1 (0.44) TDP1ABL1RIN1MAPTKDM4E
SCHEMBL8623105 0.76 TDP1 (0.42) TDP1ABL1RIN1MAPTKDM4E
SCHEMBL8651114 0.73 TDP1 (0.50) TDP1ABL1RIN1MAPTKDM4E
SCHEMBL6652326 0.69 PKM (0.43) TDP1ABL1RIN1PKMSIRT5
SCHEMBL192937 0.67 TDP1 (0.53) TDP1ABL1RIN1MAPTKDM4E
SCHEMBL723098 0.67 TDP1 (0.57) TDP1ABL1RIN1MAPTKDM4E
SCHEMBL8558061 0.67 TDP1 (0.41) TDP1ABL1RIN1MAPTKDM4E
SCHEMBL4538698 0.65
Methoxymethane SCHEMBL1711287 0.65 ABL1 (0.34) TDP1ABL1RIN1MAPT
SCHEMBL721699 0.63 TDP1 (0.53) TDP1ABL1RIN1MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1805561-B1 ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS MERCK PATENT GMBH (DE) 2018-10-24 EP claimed
EP-2344927-A2 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2011-07-20 EP claimed
WO-2010043946-A2 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-04-22 WO claimed
US-20100092894-A1 Bottom Antireflective Coating Compositions AZ ELECTRONIC MATERIALS USA CORP. 2010-04-15 US claimed
US-7691556-B2 Antireflective compositions for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-04-06 US claimed
EP-2152822-A2 ANTIREFLECTIVE COATING COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2010-02-17 EP claimed
WO-2008139320-A2 ANTIREFLECTIVE COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-11-20 WO claimed
US-20080286689-A1 Antireflective Coating Compositions AZ ELECTRONICS MATERIALS USA CORP. 2008-11-20 US claimed
EP-1805561-A2 ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS AZ Electronic Materials USA Corp. (US) 2007-07-11 EP claimed
WO-2006030320-A2 ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2006-03-23 WO claimed
US-20060058468-A1 Antireflective compositions for photoresists MERCK PATENT GMBH (DE) 2006-03-16 US claimed
US-20060057501-A1 Antireflective compositions for photoresists AZ ELECTRONIC MATERIALS USA CORP. 2006-03-16 US claimed
CN-110998446-B Polymer for forming bottom anti-reflective coating and composition for forming bottom anti-reflective coating comprising same SK新技术株式会社 2023-04-07 CN disclosed
US-11435667-B2 Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same SK INNOVATION CO., LTD. (KR) 2022-09-06 US disclosed
EP-3543243-B1 PROCESS FOR THE PREPARATION OF CUCURBITURIL DERIVATIVES AQDOT LTD (GB) 2022-02-02 EP disclosed
US-20200264509-A1 Polymer for Organic Bottom Anti-Reflective Coating and Bottom Anti-Reflective Coating Composition Containing the Same SK GEO CENTRIC CO., LTD. (KR) 2020-08-20 US disclosed
WO-2006030320-A2 ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2006-03-23 WO disclosed
US-20060058468-A1 Antireflective compositions for photoresists MERCK PATENT GMBH (DE) 2006-03-16 US disclosed
US-20060057501-A1 Antireflective compositions for photoresists AZ ELECTRONIC MATERIALS USA CORP. 2006-03-16 US disclosed
US-4255558-A POLYETHER COPOLYMERS BASED ON TETRAMETHYLOL GLYCOLURIL AND A POLYOL; HEAT FUSION SCM CORPORATION (US) 1981-03-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100092894-A1 Bottom Antireflective Coating Compositions SDC2, MYOC, S100A9 TDP1 2598/4885ABL1 3187/4885RIN1 3014/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.