SCHEMBL13111173

SCHEMBL13111173

CC(C)=CC(=O)OC12CC3CC(C1)CC(OC(CO)CO)(C3)C2

nearest known ligand 0.40

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 2/20 0.33
DPP4 P27487 1/20 0.31
DPP8 Q6V1X1 1/20 0.31
DPP9 Q86TI2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3451058 0.84 PRKCA (0.34) PRKCA
SCHEMBL13111166 0.81 DPP8 (0.31) DPP8DPP9
SCHEMBL13111151 0.80 NPSR1 (0.32) DPP8DPP9
SCHEMBL3452469 0.80 PRKCA (0.33) PRKCADPP4
SCHEMBL17135352 0.77 TSHR (0.39) DPP4
SCHEMBL14457946 0.76 NAAA (0.42)
SCHEMBL16724514 0.76 PRKCA (0.35) PRKCA
SCHEMBL13111150 0.76
SCHEMBL16675027 0.75 DPP8 (0.32) PRKCADPP4DPP8DPP9
SCHEMBL5608309 0.71 DPP4 (0.43) DPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7820360-B2 Polymer compound, negative resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-10-26 US disclosed
US-20090162785-A1 POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2009-06-25 US disclosed