⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3422084 | 0.84 | — | — | |
| SCHEMBL17135352 | 0.82 | TSHR (0.39) | — | |
| SCHEMBL3338491 | 0.79 | — | — | |
| SCHEMBL14457946 | 0.78 | NAAA (0.42) | — | |
| SCHEMBL13111151 | 0.77 | NPSR1 (0.32) | — | |
| SCHEMBL13111173 | 0.76 | PRKCA (0.33) | — | |
| SCHEMBL18775975 | 0.75 | CYP19A1 (0.33) | — | |
| SCHEMBL18785629 | 0.74 | CYP17A1 (0.31) | — | |
| SCHEMBL27798351 | 0.74 | — | — | |
| SCHEMBL17052467 | 0.73 | DPP8 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7820360-B2 | Polymer compound, negative resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-26 | — | — | US | disclosed |
| US-20090162785-A1 | POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |