SCHEMBL13144239

SCHEMBL13144239

CCC(C)c1ccc(C(=O)OCCn2c3ccccc3c3ccccc32)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 3/20 0.50
PTGER4 P35408 1/20 0.45
HPGD P15428 3/20 0.44
CYP1A2 P05177 1/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
STAT6 P42226 1/20 0.44
HSD17B10 Q99714 1/20 0.44
ALDH1A1 P00352 2/20 0.44
PPARG P37231 1/20 0.43
PPARD Q03181 1/20 0.43
PPARA Q07869 1/20 0.43
CNR2 P34972 2/20 0.43
FNTA P49354 1/20 0.42
FNTB P49356 1/20 0.42
SCARB1 Q8WTV0 1/20 0.41
LMNA P02545 1/20 0.41
MEN1 O00255 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14094215 0.82 RAB9A (0.48) HPGDCYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL11701782 0.81 TDP1 (0.56) PTGS2HPGDCYP1A2CYP3A4CYP2D6
SCHEMBL13133665 0.79 ALDH1A1 (0.38) HPGDCYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL13144237 0.78 SMN1; SMN2 (0.67) HPGDHSD17B10ALDH1A1LMNAMEN1
SCHEMBL13144234 0.77 CXCR3 (0.44) PTGER4HPGDALDH1A1CNR2
SCHEMBL10178794 0.76 MEN1 (0.47) PTGS2PTGER4ALDH1A1PPARGPPARD
SCHEMBL13144176 0.75 LMNA (0.60) PTGS2HPGDALDH1A1LMNAMEN1
SCHEMBL14022183 0.74 ESR1 (0.64) HPGDCYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL10089271 0.74 CYP3A4 (0.49) HPGDCYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL1789210 0.74 CA1 (0.59) HPGDCYP1A2CYP3A4ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7799506-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-09-21 US disclosed
US-20090087776-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed