Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | LTA4H | P09960 | 1/20 | 0.31 |
| ▸ | MPO | P05164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15914882 | 0.84 | LMNA (0.34) | LMNATSHRTRPA1 | |
| SCHEMBL703386 | 0.84 | PRNP (0.33) | LMNATSHRL3MBTL1LTA4HMPO | |
| SCHEMBL647412 | 0.84 | L3MBTL1 (0.32) | LMNATSHRTRPA1L3MBTL1LTA4H | |
| SCHEMBL1315904 | 0.84 | TSHR (0.38) | LMNATSHRTRPA1L3MBTL1 | |
| SCHEMBL1314542 | 0.82 | LMNA (0.33) | LMNATSHRTRPA1L3MBTL1LTA4H | |
| SCHEMBL1314415 | 0.82 | LMNA (0.33) | LMNATSHRTRPA1 | |
| SCHEMBL6144390 | 0.82 | LMNA (0.33) | LMNAL3MBTL1LTA4H | |
| SCHEMBL1315239 | 0.82 | — | — | |
| SCHEMBL1317031 | 0.82 | LTA4H (0.40) | TSHRL3MBTL1LTA4H | |
| SCHEMBL1315769 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2584005-B1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | TOSOH CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-8907038-B2 | Typical metal containing polysiloxane composition, process for its production, and its uses | TOSOH CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| EP-2584005-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | Tosoh Corporation (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-20130090447-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES | TOSOH CORPORATION (JP) | 2013-04-11 | — | — | US | disclosed |
| US-8163950-B2 | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110275849-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2011-11-10 | — | — | US | disclosed |
| US-8008521-B2 | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes | HOKKO CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2009-03-26 | — | — | US | disclosed |
| US-7459577-B2 | Reacting a chlorosilane with grignard reagent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| US-7413775-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2008-08-19 | — | — | US | disclosed |
| CN-100367472-C | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2008-02-06 | — | — | CN | disclosed |
| US-7160625-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20060127683-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2006-06-15 | — | — | US | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |
| US-20030180550-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2003-09-25 | — | — | US | disclosed |
| CN-1437228-A | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2003-08-20 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110275849-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | MLX, HAX1, RPS4X | LMNA 2559/4885TSHR 954/4885TRPA1 3320/4885 |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | MLX, HAX1, RPS4X | LMNA 2559/4885TSHR 954/4885TRPA1 3320/4885 |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | MLX, HAX1, GRIA3 | LMNA 3594/4885TSHR 682/4885TRPA1 2963/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.