SCHEMBL1315215

SCHEMBL1315215

CO[Si](c1ccccc1)(c1ccccc1)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 1/20 0.36
SLC6A4 P31645 1/20 0.36
POLB P06746 1/20 0.36
ELANE P08246 1/20 0.36
ALDH1A1 P00352 5/20 0.35
RAB9A P51151 2/20 0.35
IDO1 P14902 2/20 0.34
GAA P10253 2/20 0.34
ALOX15 P16050 1/20 0.34
KDM4E B2RXH2 2/20 0.33
NR1H2 P55055 1/20 0.33
NR1H3 Q13133 1/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33
HIF1A Q16665 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
FABP7 O15540 1/20 0.32
FABP5 Q01469 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4999771 0.98 SLC6A2 (0.34) SLC6A2SLC6A4POLBELANEALDH1A1
SCHEMBL15914989 0.83 RAB9A (0.37) POLBELANEALDH1A1RAB9AIDO1
SCHEMBL301957 0.82 SLC6A2 (0.36) SLC6A2SLC6A4POLBELANEALDH1A1
SCHEMBL1313895 0.82 SLC6A2 (0.36) SLC6A2SLC6A4POLBELANEALDH1A1
SCHEMBL15915741 0.81 RAB9A (0.34) POLBELANEALDH1A1RAB9AIDO1
SCHEMBL22977552 0.81 ALDH1A1 (0.36) SLC6A2SLC6A4POLBELANEALDH1A1
SCHEMBL301913 0.80 SLC6A2 (0.33) SLC6A2SLC6A4POLBELANEALDH1A1
SCHEMBL1313863 0.79 L3MBTL1 (0.35) SLC6A2SLC6A4ALDH1A1RAB9AIDO1
SCHEMBL1316677 0.79 IDO1 (0.39) ALDH1A1IDO1GAAALOX15LMNA
SCHEMBL4999648 0.77 ALDH1A1 (0.34) SLC6A2SLC6A4ALDH1A1RAB9AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2584005-B1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF TOSOH CORP (JP) 2018-02-21 EP disclosed
US-9260458-B2 Method of producing an organic silicon compound DOW CORNING CORPORATION (US) 2016-02-16 US disclosed
US-20150141689-A1 Method Of Producing An Organic Silicon Compound DOW TORAY CO., LTD. (JP) 2015-05-21 US disclosed
US-8907038-B2 Typical metal containing polysiloxane composition, process for its production, and its uses TOSOH CORPORATION (JP) 2014-12-09 US disclosed
EP-2797855-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND Dow Corning Toray Co., Ltd. (JP) 2014-11-05 EP disclosed
WO-2013100166-A1 METHOD OF PRODUCING AN ORGANIC SILICON COMPOUND DOW CORNING TORAY CO., LTD. (JP) 2013-07-04 WO disclosed
EP-2584005-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF Tosoh Corporation (JP) 2013-04-24 EP disclosed
US-20130090447-A1 TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES TOSOH CORPORATION (JP) 2013-04-11 US disclosed
US-8163950-B2 Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-24 US disclosed
US-20110275849-A1 PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES BANNOU TADASHI 2011-11-10 US disclosed
US-8008521-B2 Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes HOKKO CHEMICAL INDUSTRY CO., LTD. (JP) 2011-08-30 US disclosed
US-20090082585-A1 PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES BANNOU TADASHI 2009-03-26 US disclosed
US-7459577-B2 Reacting a chlorosilane with grignard reagent SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-02 US disclosed
US-7413775-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2008-08-19 US disclosed
US-7160625-B2 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION (JP) 2007-01-09 US disclosed
US-20060127683-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2006-06-15 US disclosed
US-20050070730-A1 Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-31 US disclosed
US-20030180550-A1 Insulating film material containing an organic silane compound, its production method and semiconductor device TOSOH CORPORATION 2003-09-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110275849-A1 PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES MLX, HAX1, RPS4X SLC6A2 4310/4885SLC6A4 2963/4885POLB 1839/4885
US-20090082585-A1 PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES MLX, HAX1, RPS4X SLC6A2 4310/4885SLC6A4 2963/4885POLB 1839/4885
US-20050070730-A1 Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes MLX, HAX1, GRIA3 SLC6A2 4353/4885SLC6A4 3273/4885POLB 2070/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.