Formaldehyde Sulfinic Acid

Formaldehyde Sulfinic Acid

SCHEMBL1315567

O.O=S([O-])CO.[Na+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Formaldehyde Sulfinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120004810-A Trifluoroethyl thioether compound containing pyrimidyl amine 湖南化工研究院有限公司 2025-05-16 CN claimed
CN-120004774-A Trifluoro containing sulfonate Ethyl sulfide compound 湖南化工研究院有限公司 2025-05-16 CN claimed
CN-116903796-A Acrylic emulsion with strong adhesive force for printing ink and preparation method thereof 中山市富日印刷材料有限公司 2023-10-20 CN claimed
CN-112029320-B Ceramic powder capable of promoting blood circulation, sterilizing and releasing far infrared rays and application of ceramic powder in diatom ooze water-based paint 刘鹏 2022-09-30 CN claimed
CN-114031424-A Surface metallization method of microwave dielectric ceramic material and microwave dielectric ceramic device 大富科技(安徽)股份有限公司 2022-02-11 CN claimed
CN-109439034-B Bi-component diatom ooze water-based paint with zero VOC (volatile organic compounds) emission 刘鹏 2021-05-14 CN claimed
CN-112029320-A Ceramic powder capable of promoting blood circulation, sterilizing and releasing far infrared rays and application of ceramic powder in diatom ooze water-based paint 刘鹏 2020-12-04 CN claimed
CN-111116839-A High slump loss resistant mud resistant polycarboxylate superplasticizer mother solution as well as preparation method and application thereof 陕西友邦新材料科技有限公司 2020-05-08 CN claimed
US-8662174-B2 Radiation-induced thickening and radiation-induced triggering for set-on-command sealant compositions and methods of use HALLIBURTON ENERGY SERVICES, INC. (US) 2014-03-04 US claimed
WO-2012117227-A2 RADIATION-INDUCED THICKENING AND RADIATION-INDUCED TRIGGERING FOR SET-ON-COMMAND SEALENT COMPOSITIONS AND METHODS OF USE HALLIBURTON ENERGY SERVICES, INC. (US) 2012-09-07 WO claimed
WO-2012117228-A2 RADIATION-INDUCED THICKENING FOR SET-ON-COMMAND SEALANT COMPOSITIONS AND METHODS OF USE HALLIBURTON ENERGY SERVICES, INC. (US) 2012-09-07 WO claimed
US-20110272142-A1 Radiation-Induced Thickening and Radiation-Induced Triggering for Set-On-Command Sealant Compositions and Methods of Use HALLIBURTON LAW DEPARTMENT (US) 2011-11-10 US claimed
US-20110265996-A1 Radiation-Induced Thickening for Set-On-Command Sealant Compositions and Methods of Use HALLIBURTON LAW DEPARTMENT (US) 2011-11-03 US claimed
CN-120004810-A Trifluoroethyl thioether compound containing pyrimidyl amine 湖南化工研究院有限公司 2025-05-16 CN disclosed
CN-120004774-A Trifluoro containing sulfonate Ethyl sulfide compound 湖南化工研究院有限公司 2025-05-16 CN disclosed
US-20240270887-A1 LOW ENERGY NANOEMULSION POLYMERIZATION WITH LOW LEVELS OF SURFACTANTS BASF SE (DE) 2024-08-15 US disclosed
US-20120157596-A1 Stable Polyacrylic Acids, Their Manufacture and Their Use BASF CORPORATION (US) 2012-06-21 US disclosed
WO-2011156674-A2 THIOETHER PRODRUG COMPOSITIONS AS ANTI-HIV AND ANTI-RETROVIRAL AGENTS THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 2011-12-15 WO disclosed
US-20110272142-A1 Radiation-Induced Thickening and Radiation-Induced Triggering for Set-On-Command Sealant Compositions and Methods of Use HALLIBURTON LAW DEPARTMENT (US) 2011-11-10 US disclosed
US-20110265996-A1 Radiation-Induced Thickening for Set-On-Command Sealant Compositions and Methods of Use HALLIBURTON LAW DEPARTMENT (US) 2011-11-03 US disclosed