Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.33 |
| ▸ | VDR | P11473 | 1/20 | 0.32 |
| ▸ | PRKCA | P17252 | 1/20 | 0.31 |
| ▸ | FAAH | O00519 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18674247 | 0.86 | FAAH (0.34) | FAAH | |
| SCHEMBL8986984 | 0.84 | PRKCA (0.36) | CYP4F2CYP4A11PRKCA | |
| SCHEMBL3239964 | 0.83 | FAAH (0.42) | FAAH | |
| SCHEMBL25380720 | 0.82 | PRKCA (0.46) | VDRPRKCA | |
| SCHEMBL2982491 | 0.82 | MAPT (0.33) | — | |
| SCHEMBL25380718 | 0.82 | PRKCA (0.46) | VDRPRKCA | |
| SCHEMBL4406928 | 0.82 | MAPT (0.33) | — | |
| SCHEMBL2984810 | 0.82 | MAPT (0.33) | — | |
| SCHEMBL14195313 | 0.81 | GABRP (0.39) | — | |
| SCHEMBL13115432 | 0.80 | VDR (0.30) | VDR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7771913-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-10 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20070231738-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |