SCHEMBL8986984

SCHEMBL8986984

CCC(C)(C)C(=O)OC(C)CO

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.36
RIPK1 Q13546 1/20 0.33
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32
MMP8 P22894 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17483587 0.86 PRKCA (0.34) PRKCA
SCHEMBL2982491 0.85 MAPT (0.33) MMP8
SCHEMBL4406928 0.85 MAPT (0.33) MMP8
SCHEMBL2984810 0.85 MAPT (0.33) MMP8
SCHEMBL13201528 0.84 CYP4F2 (0.33) PRKCACYP4F2CYP4A11
SCHEMBL17717733 0.82 MMP8 (0.33) MMP8
SCHEMBL18674247 0.82 FAAH (0.34)
SCHEMBL120091 0.82 RIPK1 (0.30) RIPK1
SCHEMBL19985779 0.81 PRKCA (0.33) PRKCA
SCHEMBL132911 0.80 TSHR (0.40) PRKCACYP4F2CYP4A11MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8980404-B2 Composition for imprints, pattern and patterning method FUJIFILM CORPORATION (JP) 2015-03-17 US disclosed
US-8907033-B2 Polymers, compositions and methods of use for foams, laundry detergents, shower rinses and coagulants SOLVAY USA INC. (US) 2014-12-09 US disclosed
US-8907033-B2 Polymers, compositions and methods of use for foams, laundry detergents, shower rinses and coagulants SOLVAY USA INC. (US) 2014-12-09 US disclosed
US-20140034076-A1 POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS RHODIA INC. (US) 2014-02-06 US disclosed
US-20140034076-A1 POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS RHODIA INC. (US) 2014-02-06 US disclosed
US-8580905-B2 Polymers, compositions and methods of use for foams, laundry detergents, shower rinses and coagulants RHODIA INC. (US) 2013-11-12 US disclosed
US-20130237471-A1 POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS RHODIA INC. (US) 2013-09-12 US disclosed
US-8445616-B2 Polymers, compositions and methods of use for foams, laundry detergents, shower rinses and coagulants RHODIA INC. (US) 2013-05-21 US disclosed
US-20120208701-A1 POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS RHODIA INC. (US) 2012-08-16 US disclosed
US-8188204-B2 Polymers, compositions and methods for use for foams, laundry detergents, shower rinses and coagulants RHODIA INC. (US) 2012-05-29 US disclosed
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20110257015-A1 POLYMERS, COMPOSITIONS AND METHODS FOR USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS RHODIA INC. (US) 2011-10-20 US disclosed
US-20110183127-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
US-7939601-B1 Polymers, compositions and methods of use for foams, laundry detergents, shower rinses, and coagulants RHODIA INC. (US) 2011-05-10 US disclosed
US-7771913-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-08-10 US disclosed
US-7642034-B2 Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-01-05 US disclosed
US-7622242-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-24 US disclosed
US-20090081588-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-26 US disclosed
US-20070231738-A1 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-10-04 US disclosed
US-20070178407-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-08-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120208701-A1 POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS DSG1, DSTN, TES PRKCA 1716/4885RIPK1 2799/4885CYP4F2 4408/4885
US-20110257015-A1 POLYMERS, COMPOSITIONS AND METHODS FOR USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS DSG1, DSTN, TES PRKCA 1811/4885RIPK1 2792/4885CYP4F2 4398/4885
US-20140034076-A1 POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS DSG1, DSTN, CUTA PRKCA 1966/4885RIPK1 2817/4885CYP4F2 4265/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.