SCHEMBL13327337

SCHEMBL13327337

CCOC(C)OC(=O)c1ccc2ccccc2c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.49
ADRB1 P08588 1/20 0.49
ADRB3 P13945 1/20 0.49
UTS2R Q9UKP6 1/20 0.47
CES2 O00748 1/20 0.46
CES1 P23141 1/20 0.46
NPC1 O15118 4/20 0.46
RAB9A P51151 4/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
ALDH1A1 P00352 2/20 0.46
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 2/20 0.44
HPGD P15428 1/20 0.44
HRH3 Q9Y5N1 2/20 0.44
PTPN1 P18031 1/20 0.44
HDAC3 O15379 2/20 0.43
HDAC1 Q13547 2/20 0.43
HDAC2 Q92769 2/20 0.43
DRD3 P35462 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17798292 0.83 RAB9A (0.44) NPC1RAB9ASMN1; SMN2MEN1KMT2A
SCHEMBL8375375 0.82 CA1 (0.50) ALDH1A1MEN1KMT2AHPGDGAA
SCHEMBL13327336 0.82 ADRB2 (0.51) ADRB2ADRB1ADRB3UTS2RCES2
SCHEMBL23997992 0.81 NPC1 (0.64) ADRB2ADRB1ADRB3UTS2RCES2
SCHEMBL9166635 0.81 TSHR (0.52) ADRB2ADRB1ADRB3NPC1RAB9A
SCHEMBL570100 0.80 ADRB2 (0.52) ADRB2ADRB1ADRB3UTS2RCES2
SCHEMBL23998049 0.78 CES2 (0.52) ADRB2ADRB1ADRB3UTS2RCES2
SCHEMBL24012957 0.78 CES2 (0.52) ADRB2ADRB1ADRB3UTS2RCES2
SCHEMBL571295 0.78 CA12 (0.59) ADRB2ADRB1ADRB3CES2CES1
SCHEMBL30684671 0.78 CA12 (0.59) ADRB2ADRB1ADRB3CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7714316-B2 Method of manufacturing semiconductor device, acid etching resistance material and copolymer KABUSHIKI KAISHA TOSHIBA (JP) 2010-05-11 US disclosed
US-20080261149-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER ASAKAWA KOJI 2008-10-23 US disclosed