Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.57 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | ASAH1 | Q13510 | 1/20 | 0.45 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.44 |
| ▸ | CNR2 | P34972 | 1/20 | 0.44 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | BRD4 | O60885 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1854485 | 0.86 | ALDH1A1 (0.52) | ALDH1A1KMT2AHTTL3MBTL1ASAH1 | |
| SCHEMBL133915 | 0.84 | CNR2 (0.51) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 | |
| SCHEMBL25168045 | 0.84 | L3MBTL1 (0.46) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 | |
| SCHEMBL4698252 | 0.84 | SMN1; SMN2 (0.47) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 | |
| SCHEMBL3447293 | 0.84 | CNR2 (0.46) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 | |
| SCHEMBL25736832 | 0.84 | L3MBTL1 (0.46) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 | |
| SCHEMBL17329317 | 0.84 | NPC1 (0.56) | KMT2AL3MBTL1ASAH1NR1H2CNR2 | |
| SCHEMBL29145178 | 0.83 | L3MBTL1 (0.66) | ALDH1A1KMT2AHTTL3MBTL1ASAH1 | |
| SCHEMBL2340371 | 0.82 | L3MBTL1 (0.45) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 | |
| SCHEMBL14838247 | 0.82 | CYP1A2 (0.47) | ALDH1A1KMT2AL3MBTL1NR1H2CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 410 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12306538-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2025-05-20 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11453734-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2022-09-27 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-20210200097-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| US-11042094-B2 | Treatment liquid and pattern forming method | FUJIFILM CORPORATION (JP) | 2021-06-22 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-5977101-A | Benzimidazoles/Imidazoles Linked to a Fibrinogen Receptor Antagonist Template Having Vitronectin Receptor Antagonist Activity | SMITHKLINE BEECHAM CORPORATION (US) | 1999-11-02 | — | — | US | disclosed |
| EP-0946180-A1 | METHOD FOR STIMULATING BONE FORMATION | SMITHKLINE BEECHAM CORPORATION (US) | 1999-10-06 | — | — | EP | disclosed |
| WO-1998015278-A1 | METHOD FOR STIMULATING BONE FORMATION | SMITHKLINE BEECHAM CORPORATION (US) | 1998-04-16 | — | — | WO | disclosed |
| EP-0767792-A1 | VITRONECTIN RECEPTOR ANTAGONISTS | SMITHKLINE BEECHAM CORPORATION (US) | 1997-04-16 | — | — | EP | disclosed |
| WO-1996000730-A1 | VITRONECTIN RECEPTOR ANTAGONISTS | SMITHKLINE BEECHAM CORPORATION (US) | 1996-01-11 | — | — | WO | disclosed |