SCHEMBL13367152

SCHEMBL13367152

C/N=C(\c1ccc(Oc2ccc(C(NC)C(F)(F)F)cc2)cc1)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CTSL P07711 1/20 0.36
CTSS P25774 1/20 0.36
CTSK P43235 1/20 0.36
HPGD P15428 2/20 0.35
TSHR P16473 1/20 0.35
HTT P42858 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ALDH1A1 P00352 1/20 0.32
GAA P10253 1/20 0.32
ALOX15 P16050 1/20 0.32
HSD17B10 Q99714 1/20 0.32
MMP13 P45452 1/20 0.32
MAPT P10636 1/20 0.31
RAB9A P51151 1/20 0.31
SRD5A2 P31213 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12994634 0.83 HPGD (0.42) HPGDTSHRHTTSMN1; SMN2ALDH1A1
SCHEMBL10279764 0.83 CTSL (0.41) CTSLCTSSCTSKHPGDTSHR
SCHEMBL10239161 0.83 HPGD (0.42) HPGDTSHRHTTSMN1; SMN2ALDH1A1
SCHEMBL12197655 0.76 PTPN1 (0.38) CTSLCTSSCTSKALDH1A1GAA
SCHEMBL10150741 0.73 GAA (0.50) ALDH1A1GAAALOX15HSD17B10
SCHEMBL13911344 0.72 CTSL (0.38) CTSLCTSSCTSKTSHRHTT
SCHEMBL10233426 0.72 ALDH1A1 (0.47) HPGDTSHRSMN1; SMN2ALDH1A1GAA
SCHEMBL10138310 0.72 ALDH1A1 (0.47) HPGDTSHRSMN1; SMN2ALDH1A1GAA
SCHEMBL10279734 0.72 ALDH1A1 (0.46) CTSLCTSSCTSKTSHRHTT
SCHEMBL10239159 0.69 GAA (0.39) SMN1; SMN2ALDH1A1GAAALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7670751-B2 Photoacid generator, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
US-7556909-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-07-07 US disclosed
US-7531290-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-05-12 US disclosed
US-20090061358-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS PROXIMAL SYSTEMS CORPORATION 2009-03-05 US disclosed
US-20070099113-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
US-20070099112-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090061358-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS RER1, CRY1, CYP21A2 CTSL 4385/4885CTSS 2986/4885CTSK 3372/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.