Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10664430 | 0.80 | NPSR1 (0.30) | NPSR1 | |
| SCHEMBL328760 | 0.80 | ESR1 (0.31) | — | |
| SCHEMBL10664425 | 0.80 | ESR1 (0.31) | — | |
| SCHEMBL328759 | 0.77 | NPSR1 (0.33) | NPSR1 | |
| SCHEMBL9358978 | 0.77 | MEN1 (0.32) | — | |
| SCHEMBL2891505 | 0.76 | — | — | |
| SCHEMBL2891504 | 0.72 | NPSR1 (0.30) | NPSR1 | |
| SCHEMBL14369578 | 0.67 | ALDH1A1 (0.35) | NPSR1 | |
| SCHEMBL2463903 | 0.66 | ALDH1A1 (0.33) | NPSR1 | |
| SCHEMBL20851657 | 0.62 | ALDH1A1 (0.35) | NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 508 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240218217-A1 | THERMOSETTING RESIN COMPOSITION AND INSULATING ADHESIVE FILM THEREOF | SHENGYI TECHNOLOGY CO., LTD. (CN) | 2024-07-04 | — | — | US | claimed |
| CN-115895546-A | Thermosetting resin composition and insulating adhesive film thereof | 广东生益科技股份有限公司 | 2023-04-04 | — | — | CN | claimed |
| US-9293417-B2 | Method for forming barrier film on wiring line | TOKYO ELECTRON LIMITED (JP) | 2016-03-22 | — | — | US | claimed |
| US-8709541-B2 | Method for forming a film | TOKYO ELECTRON LIMITED (JP) | 2014-04-29 | — | — | US | claimed |
| US-20120251721-A1 | DEVICE AND METHOD FOR FORMING FILM | TOKYO ELECTRON LIMITED (JP) | 2012-10-04 | — | — | US | claimed |
| US-20120114869-A1 | FILM FORMING METHOD | TOKYO ELECTRON LIMITED (JP) | 2012-05-10 | — | — | US | claimed |
| US-20080007595-A1 | Methods of Etching Polymeric Materials Suitable for Making Micro-Fluid Ejection Heads and Micro-Fluid Ejection Heads Relating Thereto | LEXMARK INTERNATIONAL, INC. | 2008-01-10 | — | — | US | claimed |
| EP-1144310-B1 | MESOPOROUS SILICA FILM FROM A SOLUTION CONTAINING A SURFACTANT AND METHODS OF MAKING SAME | BATTELLE MEMORIAL INSTITUTE (US) | 2007-05-30 | — | — | EP | claimed |
| US-7129187-B2 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED (JP) | 2006-10-31 | — | — | US | claimed |
| WO-2006019438-A2 | LOW-TEMPERATURE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF SILICON-NITROGEN-CONTAINING FILMS | TOKYO ELECTRON LIMITED (JP) | 2006-02-23 | — | — | WO | claimed |
| US-20060014399-A1 | Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films | TOKYO ELECTRON LIMITED | 2006-01-19 | — | — | US | claimed |
| US-6329062-B1 | NANOCRYSTALS, LOW DIELECTRIC CONSTANT, POROUS BINDER | NOVELLUS SYSTEMS, INC. | 2001-12-11 | — | — | US | claimed |
| US-6140252-A | REDUCING CAPACITIVE COUPLING ON A SEMICONDUCTOR DEVICE USING ELECTRICAL INSULATORS MADE OF POROUS DIELECTRIC MATERIALS. | TEXAS INSTRUMENTS INCORPORATED (US) | 2000-10-31 | — | — | US | claimed |
| US-6140254-A | SPIN DEPOSITING A FLUID ALKOXYSILANE COMPOSITION ONTO A SURFACE OF A SUBSTRATE, HYDROPHOBIZING AGENT | ALLIEDSIGNAL INC. (US) | 2000-10-31 | — | — | US | claimed |
| US-6045978-A | FORMING AN ION ETCH BARRIER LAYER AFTER PATTERNING; COATING A SEMICONDUCTOR WITH A MIXTURE COMPRISING AN ESTERALKYLENE ETHER COMPOUND AND A SILYLATING AGENT, DRYING, HEATING TO INITIATING THE REACTION | TRW INC. (US) | 2000-04-04 | — | — | US | claimed |
| US-5981143-A | A REACTION PRODUCT OF A COMPOUND CONTAING ORGANIC ESTER ALKYL ETHER DERIVATIVE AND A SILYATING AGENT USED AS ION ETCH BARRIER | TRW INC. (US) | 1999-11-09 | — | — | US | claimed |
| EP-0919874-A2 | Photoresist composition effective for use as an ion etch barrier after patterning | TRW Inc. (US) | 1999-06-02 | — | — | EP | claimed |
| EP-0184567-B1 | PROCESS FOR THE FORMATION OF NEGATIVE PATTERNS IN A PHOTORESIST LAYER | UCB Electronics, S.A. (BE) | 1989-12-13 | — | — | EP | claimed |
| WO-2026104032-A1 | SILICONE-BASED RESIN COMPOSITION AND METHOD OF PREPARING THE SAME | WACKER CHEMIE AG (DE) | 2026-05-21 | — | — | WO | disclosed |
| US-3994939-A | BACTERICIDES | PFIZER INC. (US) | 1976-11-30 | — | — | US | disclosed |