⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methyl Alcohol SCHEMBL28262055 | 0.97 | DGAT1 (0.46) | — | |
| SCHEMBL9562001 | 0.94 | DGAT1 (0.44) | — | |
| Bicarbonate SCHEMBL14689679 | 0.94 | ALDH1A1 (0.47) | — | |
| Propanol SCHEMBL28070561 | 0.84 | DGAT1 (0.38) | — | |
| SCHEMBL28176663 | 0.83 | PKM (0.43) | — | |
| SCHEMBL6863429 | 0.83 | ALDH1A1 (0.43) | — | |
| Methacrylic Acid SCHEMBL12100845 | 0.83 | ALDH1A1 (0.42) | — | |
| SCHEMBL15114674 | 0.81 | DGAT1 (0.44) | — | |
| SCHEMBL8197999 | 0.81 | SMN1; SMN2 (0.37) | — | |
| SCHEMBL7019538 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 10471 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-122095027-A | Modified maleated natural oil-based reaction products and slurry compositions containing the same | — | 2026-05-26 | — | — | CN | claimed |
| WO-2026101463-A2 | PRODUCTION OF METHACRYLIC ACID AND METHYL-METHACRYLATE VIA CONDENSATION OF ACETONE AND FORMYL-COA | MOJIA BIOTECH PTE. LTD. (SG) | 2026-05-15 | — | — | WO | claimed |
| CN-122055416-A | Dispersants for carbon nanotubes and carbon nanotube compositions comprising hydrophobically and hydrophilically modified maleated natural oil salts | 埃斯普投资有限公司 | 2026-05-15 | — | — | CN | claimed |
| US-20260118765-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | claimed |
| US-12601972-B2 | Resist underlayer film-forming composition with suppressed degeneration of crosslinking agent | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-14 | — | — | US | claimed |
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | claimed |
| US-12577591-B2 | Microorganisms and methods for increasing co-factors | GENOMATICA, INC. (US) | 2026-03-17 | — | — | US | claimed |
| CN-121578590-A | Composition for forming lower layer film of patterning material and lower layer film of patterning material | 珠海基石科技有限公司 | 2026-02-27 | — | — | CN | claimed |
| US-20260050214-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-19 | — | — | US | claimed |
| US-5075493-A | From a-hydroxycarboxylic ester in presence of aluminosilicate catalyst, and then a solid acid catalyst | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-12-24 | — | — | US | claimed |
| US-5068399-A | PROCESS FOR PREPARING UNSATURATED CARBOXYLIC ACID ESTER | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-11-26 | — | — | US | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0454501-A2 | Benzylidenethiazolidine derivatives, their preparation and their use for the inhibition of lipid peroxides | Sankyo Company Limited (JP) | 1991-10-30 | — | — | EP | claimed |
| EP-0446446-A2 | Process for preparing alpha, beta-unsaturated carboxylic acid ester | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-09-18 | — | — | EP | claimed |
| EP-0429800-A2 | Process for preparing unsaturated carboxylic acid ester | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-06-05 | — | — | EP | claimed |
| EP-0407811-A2 | Process for producing methyl methacrylate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1991-01-16 | — | — | EP | claimed |
| EP-0379691-A1 | Process for preparing unsaturated carboxylic acid or ester thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1990-08-01 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| US-4613684-A | FROM AMIDE AND ALCOHOL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1986-09-23 | — | — | US | claimed |