Propanol

Propanol

SCHEMBL28070561

CCCO.COC(=O)C(C)(C)O

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.38
CYP4F2 P78329 3/20 0.34
CYP4A11 Q02928 3/20 0.34
ALDH1A1 P00352 2/20 0.33
TSHR P16473 2/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
USP2 O75604 1/20 0.33
LMNA P02545 1/20 0.33
POLB P06746 1/20 0.33
KDM4E B2RXH2 1/20 0.31
PKM P14618 1/20 0.31
SRC P12931 1/20 0.31
ACHE P22303 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
KCNN4 O15554 1/20 0.30
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9562001 0.85 DGAT1 (0.44) DGAT1ALDH1A1TSHRSRCKCNN4
SCHEMBL134110 0.84
Methyl Alcohol SCHEMBL28262055 0.82 DGAT1 (0.46) DGAT1ALDH1A1TSHRSRCKCNN4
Bicarbonate SCHEMBL14689679 0.79 ALDH1A1 (0.47) DGAT1ALDH1A1TSHRSRCKCNN4
SCHEMBL28176663 0.79 PKM (0.43) DGAT1CYP4F2CYP4A11ALDH1A1TSHR
SCHEMBL28111231 0.78 GAA (0.48) CYP4F2CYP4A11ALDH1A1POLBKDM4E
SCHEMBL30009756 0.76 ALDH1A1 (0.40) DGAT1ALDH1A1TSHRPOLBSRC
SCHEMBL29242722 0.73 DGAT1 (0.36) DGAT1ALDH1A1LMNA
SCHEMBL28173152 0.71 AR (0.39) DGAT1CYP4F2CYP4A11ALDH1A1TSHR
Acetic Acid Methyl Ester SCHEMBL467959 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105824197-A Coating compositions for use with an overcoated photoresist 罗门哈斯电子材料有限公司 2016-08-03 CN disclosed
CN-105759569-A Coating Compositions For Use With Overcoated Photoresist 罗门哈斯电子材料有限公司 2016-07-13 CN disclosed