Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.34 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | KISS1R | Q969F8 | 2/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.32 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.32 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.32 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12975369 | 0.88 | LMNA (0.36) | HSD17B10KEAP1NFE2L2CYP2D6CYP2C19 | |
| SCHEMBL3834863 | 0.82 | — | — | |
| SCHEMBL9975574 | 0.82 | — | — | |
| SCHEMBL13627727 | 0.82 | — | — | |
| SCHEMBL15601944 | 0.80 | SLC22A6 (0.43) | KISS1RMAPT | |
| SCHEMBL606666 | 0.79 | — | — | |
| SCHEMBL2632918 | 0.77 | — | — | |
| SCHEMBL29537344 | 0.77 | TSHR (0.37) | HSD17B10KEAP1NFE2L2EPHX1ADRB2 | |
| SCHEMBL19822035 | 0.75 | ADRB2 (0.33) | EPHX1MAPTADRB2ADRB1ADRB3 | |
| SCHEMBL6289558 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9202709-B2 | Polishing liquid for metal and polishing method using the same | FUJIFILM CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20100075500-A1 | Metal polishing slurry and chemical mechanical polishing method | FUJIFILM CORPORATION (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100075500-A1 | Metal polishing slurry and chemical mechanical polishing method | FUJIFILM CORPORATION (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| US-20090239380-A1 | POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-2045318-A1 | Cleaning agent for semiconductor device and cleaning method using the same | FUJIFILM Corporation (JP) | 2009-04-08 | — | — | EP | disclosed |
| US-20090088361-A1 | CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090088361-A1 | CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090088361-A1 | CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME | AOC1, SPIN1, USP1 | HSD17B10 4735/4885KEAP1 2229/4885NFE2L2 2908/4885 |
| US-20100075500-A1 | Metal polishing slurry and chemical mechanical polishing method | NOX1, NOXO1, PIEZO1 | HSD17B10 4344/4885KEAP1 2929/4885NFE2L2 1812/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.