Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.36 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | DPP4 | P27487 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | NAAA | Q02083 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL822780 | 0.90 | ALDH1A1 (0.36) | DPP8DPP9ALDH1A1MEN1KMT2A | |
| SCHEMBL6561563 | 0.85 | — | — | |
| SCHEMBL513151 | 0.85 | DPP4 (0.31) | DPP4 | |
| SCHEMBL685948 | 0.84 | ALDH1A1 (0.37) | PKMDPP8DPP9HSD11B1ALDH1A1 | |
| SCHEMBL43550 | 0.82 | NAAA (0.41) | ALDH1A1MEN1KMT2ANAAA | |
| SCHEMBL6560570 | 0.82 | DPP4 (0.37) | ALDH1A1DPP4MEN1KMT2ANAAA | |
| SCHEMBL12432875 | 0.82 | TSHR (0.40) | ALDH1A1MEN1KMT2ANAAA | |
| SCHEMBL22176954 | 0.82 | MEN1 (0.32) | ALDH1A1MEN1KMT2A | |
| SCHEMBL4863639 | 0.82 | MEN1 (0.32) | ALDH1A1MEN1KMT2A | |
| SCHEMBL12205968 | 0.82 | POLB (0.41) | PKMDPP8DPP9ALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1381 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121559814-B | Ultraviolet curing nano-imprint photoresist with semi-interpenetrating network structure and preparation method thereof | 中国科学技术大学 | 2026-05-12 | — | — | CN | claimed |
| CN-119285842-A | Fluorine-containing polymer, preparation method thereof and ArF immersed photoresist prepared from fluorine-containing polymer | 瑞红(苏州)电子化学品股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-118930715-A | Acrylic resin polymer and preparation method and application thereof | 中国科学院宁波材料技术与工程研究所 | 2024-11-12 | — | — | CN | claimed |
| CN-118363266-A | Preparation method of dry film resist | 珠海市容大感光科技有限公司 | 2024-07-19 | — | — | CN | claimed |
| CN-115160495-B | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2024-05-14 | — | — | CN | claimed |
| CN-117659263-A | Weather-resistant room-temperature-degradable water-soluble photosensitive resin, application and preparation method thereof | 中国地质大学（武汉） | 2024-03-08 | — | — | CN | claimed |
| CN-114380937-B | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技股份有限公司 | 2023-04-07 | — | — | CN | claimed |
| CN-115160495-A | Photoresist film-forming resin containing maleimide structure and preparation method thereof | 四川华造宏材科技有限公司 | 2022-10-11 | — | — | CN | claimed |
| CN-114380937-A | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-108132584-B | Photoresist composition containing poly (p-hydroxystyrene) polymer and acrylate copolymer | 江苏汉拓光学材料有限公司 | 2020-12-08 | — | — | CN | claimed |
| US-7579132-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | claimed |
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-02-21 | — | — | US | claimed |
| CN-1961260-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2007-05-09 | — | — | CN | claimed |
| EP-1766474-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2007-03-28 | — | — | EP | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| CN-1259595-C | Chemical amplifying type positive photolithographic gelatin composition | SUMITOMO CHEMICAL CO (JP) | 2006-06-14 | — | — | CN | claimed |
| WO-2005121894-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. (DE) | 2005-12-22 | — | — | WO | claimed |
| US-20050271974-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2005-12-08 | — | — | US | claimed |
| US-6846609-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-25 | — | — | US | claimed |
| US-20030113661-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-06-19 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080044738-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | NHERF1, SLC26A3, HCN3 | PKM 3751/4885DPP8 4860/4885DPP9 4810/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.