SCHEMBL13446336

SCHEMBL13446336

CS(=O)(=O)ON1C(=O)CC1=O

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
PARL Q9H300 2/20 0.36
USP2 O75604 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64828 0.85 PARL (0.50) PARLUSP2TSHR
SCHEMBL64591 0.81 PARL (0.42) PARLTSHR
SCHEMBL10795075 0.73 NOTUM (0.46) PARL
SCHEMBL4827266 0.70 USP2 (0.30) USP2TSHR
SCHEMBL63146 0.70 MGLL (0.38) USP2TSHR
SCHEMBL14707486 0.70 VDR (0.36) USP2TSHR
SCHEMBL4834426 0.70
SCHEMBL13495288 0.67
SCHEMBL14076055 0.67 ALDH1A1 (0.33)
SCHEMBL12332146 0.66 NPSR1 (0.41) USP2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8940476-B2 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film FUJIFILM CORPORATION (JP) 2015-01-27 US disclosed
US-20120264054-A1 PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-10-18 US disclosed