Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | VDR | P11473 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.33 |
| ▸ | MAPT | P10636 | 5/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.33 |
| ▸ | HPGD | P15428 | 4/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.33 |
| ▸ | F2 | P00734 | 3/20 | 0.33 |
| ▸ | XBP1 | P17861 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL66141 | 0.73 | KDM4E (0.61) | VDRKDM4EMAPTALDH1A1HPGD | |
| SCHEMBL2382893 | 0.73 | VDR (0.33) | VDRKDM4EMAPTALDH1A1HPGD | |
| SCHEMBL5551755 | 0.70 | KDM4E (0.41) | VDRKDM4EMAPTALDH1A1HPGD | |
| SCHEMBL4827266 | 0.70 | USP2 (0.30) | USP2TSHR | |
| SCHEMBL13446336 | 0.70 | PARL (0.36) | USP2TSHR | |
| SCHEMBL64828 | 0.70 | PARL (0.50) | USP2TSHR | |
| SCHEMBL63146 | 0.70 | MGLL (0.38) | MAPTALDH1A1NPSR1LMNAUSP2 | |
| SCHEMBL5551952 | 0.69 | MAPT (0.71) | VDRKDM4EMAPTALDH1A1HPGD | |
| SCHEMBL5556202 | 0.68 | KDM4E (0.50) | VDRKDM4EMAPTALDH1A1HPGD | |
| SCHEMBL14509461 | 0.68 | KMT2A (0.68) | VDRKDM4EMAPTALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-9086623-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition and actinic-ray- or radiation-sensitive film | FUJIFILM CORPORATION (JP) | 2015-07-21 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130049149-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND ACTINIC-RAY- OR RADIATION-SENSITIVE FILM | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |