SCHEMBL13459028

SCHEMBL13459028

OCC(O)COCCCC1CCCCC1

nearest known ligand 0.49

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ USP2 O75604 1/20 0.49
▸ CYP1A2 P05177 1/20 0.39
▸ EPHX1 P07099 1/20 0.37
▸ SIGMAR1 Q99720 3/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ NAAA Q02083 1/20 0.35
▸ HRH3 Q9Y5N1 1/20 0.34
▸ FKBP1A P62942 1/20 0.33
▸ CYSLTR2 Q9NS75 1/20 0.33
▸ CYSLTR1 Q9Y271 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10552449 0.93 USP2 (0.54) USP2CYP1A2EPHX1SIGMAR1NAAA
SCHEMBL13459004 0.91 USP2 (0.46) USP2CYP1A2EPHX1SIGMAR1SMN1; SMN2
SCHEMBL13500021 0.86 CYP1A2 (0.48) USP2CYP1A2EPHX1SIGMAR1SMN1; SMN2
SCHEMBL21358600 0.81 NFE2L2 (0.37) USP2CYP1A2EPHX1SIGMAR1SMN1; SMN2
SCHEMBL21402622 0.79 PRMT5 (0.46) USP2
SCHEMBL7401026 0.77 PRMT5 (0.43) USP2
SCHEMBL9238273 0.77 PRMT5 (0.43) USP2
SCHEMBL25476768 0.77 SMN1; SMN2 (0.43) EPHX1SMN1; SMN2NAAAFKBP1A
SCHEMBL13500027 0.76 CYP1A2 (0.41) USP2CYP1A2SMN1; SMN2
SCHEMBL20794136 0.76 USP2 (0.50) USP2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110225739-B Wrinkle-improving agent 宝丽化成工业有限公司 2022-03-15 — — CN disclosed
US-10813859-B2 Wrinkle ameliorating agent POLA CHEMICAL INDUSTRIES, INC. (JP) 2020-10-27 — — US disclosed
EP-3545942-A1 WRINKLE AMELIORATING AGENT Pola Chemical Industries Inc. (JP) 2019-10-02 — — EP disclosed
CN-106243353-A A kind of BDATHQ type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-12-21 — — CN disclosed
CN-106220851-A A kind of YASI type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-12-14 — — CN disclosed
CN-106220852-A A kind of BDABP type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-12-14 — — CN disclosed
CN-106220850-A A kind of DADHBP type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-12-14 — — CN disclosed
CN-106146841-A A kind of DAHTM type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146845-A A kind of BDADDE type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146847-A A kind of BAHPFP type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146848-A A kind of 14BDAPB type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146843-A A kind of BDAPP type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146846-A A kind of BAHPP type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146842-A A kind of 13BDAPB type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106146844-A A kind of BDAPFP type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-23 — — CN disclosed
CN-106117554-A A kind of BDADDS type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-16 — — CN disclosed
CN-106117517-A A kind of BDADDM type siliceous epoxy acid imide matrix resin and preparation method thereof 东华大学 2016-11-16 — — CN disclosed
CN-106116260-A A kind of granolith sheet material and preparation method thereof 吴海屏 2016-11-16 — — CN disclosed
US-8829229-B2 Polyol ethers and process for making them DOW GLOBAL TECHNOLOGIES LLC (US) 2014-09-09 — — US disclosed
WO-2010027663-A1 POLYOL ETHERS AND PROCESS FOR MAKING THEM DOW GLOBAL TECHNOLOGIES INC. (US) 2010-03-11 — — WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10813859-B2 Wrinkle ameliorating agent COL2A1, COL1A1, COL14A1 USP2 950/4885CYP1A2 2606/4885EPHX1 4188/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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