Diphenylamine

Diphenylamine

SCHEMBL1346068

F[B-](F)(F)F.F[B-](F)(F)F.F[B-](F)(F)F.F[B-](F)(F)F.F[B-](F)(F)F.F[B-](F)(F)F.N#N.c1ccc(Nc2ccccc2)cc1

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 5/20 0.67
ALDH1A1 P00352 7/20 0.63
TDP1 Q9NUW8 7/20 0.63
TSHR P16473 4/20 0.63
ALOX12 P18054 3/20 0.63
L3MBTL1 Q9Y468 3/20 0.63
ALOX15 P16050 2/20 0.63
PTGS1 P23219 1/20 0.63
SLC6A2 P23975 1/20 0.63
MAPK1 P28482 1/20 0.63
PTGS2 P35354 1/20 0.63
HTR2B P41595 1/20 0.63
MAPT P10636 6/20 0.55
MEN1 O00255 5/20 0.55
KMT2A Q03164 5/20 0.55
AR P10275 1/20 0.55
CYP3A4 P08684 5/20 0.50
HPGD P15428 2/20 0.50
HTT P42858 2/20 0.50
CYP1A2 P05177 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylamine SCHEMBL9645010 0.94 HSD17B10 (0.75) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL8019485 0.92 HSD17B10 (0.63) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL1344539 0.88 HSD17B10 (0.86) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL3003404 0.82 HSD17B10 (1.00) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL301493 0.82 HSD17B10 (1.00) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL1619083 0.82 HSD17B10 (1.00) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL229 0.82 HSD17B10 (1.00) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL6828443 0.82 HSD17B10 (1.00) HSD17B10ALDH1A1TDP1TSHRALOX12
SCHEMBL5196671 0.80 ALDH1A1 (0.52) HSD17B10ALDH1A1TDP1TSHRALOX12
Diphenylamine SCHEMBL4826764 0.79 HSD17B10 (0.80) HSD17B10ALDH1A1TDP1TSHRALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2185360-B1 MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES EASTMAN KODAK CO (US) 2016-03-16 EP disclosed
EP-2079586-B1 MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES EASTMAN KODAK CO (US) 2014-06-25 EP disclosed
EP-1545878-B2 THERMALLY SENSITIVE MULTILAYER IMAGEABLE ELEMENT EASTMAN KODAK CO (US) 2012-04-18 EP disclosed
US-8062827-B2 Multilayer positive-working imageable elements and their use EASTMAN KODAK COMPANY (US) 2011-11-22 US disclosed
EP-1976698-B1 MULTILAYER IMAGEABLE ELEMENT WITH IMPROVED CHEMICAL RESISTANCE EASTMAN KODAK CO (US) 2011-03-30 EP disclosed
US-7824840-B2 polymeric binder provides the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; solvent resistance; lithographic printing plates EASTMAN KODAK COMPANY (US) 2010-11-02 US disclosed
EP-2185360-A1 MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES Eastman Kodak Company (US) 2010-05-19 EP disclosed
US-20100035184-A1 MULTILAYER POSITIVE-WORKING IMAGEABLE ELEMENTS AND THEIR USE KODAK (NEAR EAST) INC. 2010-02-11 US disclosed
EP-2079586-A2 MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES EASTMAN KODAK COMPANY (US) 2009-07-22 EP disclosed
US-20090181326-A1 POSITIVE-WORKING IMAGEABLE ELEMENTS WITH CHEMICAL RESISTANCE QUALEX INC. 2009-07-16 US disclosed
US-6555291-B1 Forming an image using the thermally imageable elements comprising a polymeric layer of phenolic hydroxyl groups or substituted sulphonamide groups, removable by the aqueous alkaline developer KODAK POLYCHROME GRAPHICS, LLC 2003-04-29 US disclosed
EP-1303399-A1 THERMAL DIGITAL LITHOGRAPHIC PRINTING PLATE Kodak Polychrome Graphics Company Ltd. (US) 2003-04-23 EP disclosed
US-6534238-B1 Substrate having a hydrophilic surface; polymeric underlayer over the hydrophilic surface; top layer over the underlayer; top layer is: ink receptive; insoluble in aqueous alkaline developer; comprises solubility-suppressing component KODAK POLYCHROME GRAPHICS, LLC 2003-03-18 US disclosed
EP-1291172-A2 A multi-layer thermally imageable element Kodak Polychrome Graphics LLC (US) 2003-03-12 EP disclosed
US-20020187425-A1 Positive working; hydrophilic substrate, photosensitive compound KODAK (NEAR EAST) INC. 2002-12-12 US disclosed
EP-1241003-A2 Imageable element having a protective overlayer Kodak Polychrome Graphics Company Ltd. (US) 2002-09-18 EP disclosed
US-6358669-B1 SUBSTRATE WITH HYDROPHILIC SURFACE, OVERCOATING KODAK POLYCHROME GRAPHICS LLC 2002-03-19 US disclosed
WO-2002014071-A1 THERMAL DIGITAL LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS COMPANY LTD (US) 2002-02-21 WO disclosed
WO-2001096119-A1 THERMAL DIGITAL LITHOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) 2001-12-20 WO disclosed
US-6294311-B1 UNDERLAYER CONTAINS A COMBINATION OF POLYMERIC MATERIALS THAT PROVIDES RESISTANCE BOTH TO FOUNTAIN SOLUTION AND TO AGGRESSIVE WASHES, SUCH AS A UV WASH; CAN BE USED IN EITHER THERMALLY IMAGEABLE OR PHOTOCHEMICALLY IMAGEABLE ELEMENTS. KODAK POLYCHROME GRAPHICS LLC 2001-09-25 US disclosed