SCHEMBL3024911

SCHEMBL3024911

O=C(O)OS(=O)(=O)C(F)F.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.31
F2 P00734 1/20 0.31
SRC P12931 1/20 0.31
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547017 0.85 BCAT1 (0.36) ALDH1A1
SCHEMBL29024032 0.79
SCHEMBL28519476 0.77
SCHEMBL546401 0.76 ALDH1A1 (0.39) LMNAALDH1A1
SCHEMBL1167978 0.76 CNR2 (0.32)
SCHEMBL29721568 0.74 HTR6 (0.32) LMNAALDH1A1
SCHEMBL28987508 0.73 LMNA (0.48) LMNAF2ALDH1A1
Sulfuric Acid SCHEMBL5798234 0.70 TSHR (0.48) LMNASRCALDH1A1
SCHEMBL4389080 0.70 ALDH1A1 (0.32) F2ALDH1A1
Oxalic Acid SCHEMBL12231034 0.68 CES2 (0.41) LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100203446-A1 CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-08-12 US disclosed