SCHEMBL1355381

SCHEMBL1355381

O=C(O)CCSc1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1Cl

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKAG1 P54619 1/20 0.38
PRKAA2 P54646 1/20 0.38
PRKAB1 Q9Y478 1/20 0.38
ALDH1A1 P00352 2/20 0.36
MAPT P10636 2/20 0.36
TP53 P04637 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
PPARD Q03181 3/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
FGB P02675 1/20 0.34
POLB P06746 1/20 0.34
PRNP P04156 1/20 0.33
MAPK10 P53779 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
RXFP1 Q9HBX9 1/20 0.33
NPC1 O15118 1/20 0.33
CSNK2A2 P19784 1/20 0.33
CSNK2B P67870 1/20 0.33
CSNK2A1 P68400 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29366387 1.00 PRKAG1 (0.38) PRKAG1PRKAA2PRKAB1ALDH1A1MAPT
SCHEMBL17145190 0.89 MEN1 (0.35) ALDH1A1MAPTSMN1; SMN2PPARDMEN1
SCHEMBL353399 0.81 ALDH1A1 (0.40) PRKAG1PRKAA2PRKAB1ALDH1A1SMN1; SMN2
SCHEMBL29270398 0.79 CSNK2A2 (0.39) PRKAG1PRKAA2PRKAB1ALDH1A1MAPT
SCHEMBL30266846 0.76 KMO (0.40) MEN1KMT2AARMRGPRX4
SCHEMBL30674072 0.76 ITGB2 (0.34) NPC1
SCHEMBL4907222 0.76 SMN1; SMN2 (0.42) PRKAG1PRKAA2PRKAB1ALDH1A1MAPT
SCHEMBL17145191 0.74 RXFP1 (0.42) PRKAG1PRKAA2PRKAB1ALDH1A1SMN1; SMN2
SCHEMBL29281059 0.73 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2MEN1KMT2ANPC1
SCHEMBL6609114 0.72 SMN1; SMN2 (0.53) PRKAG1PRKAA2PRKAB1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111752098-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752097-A Self-luminous photosensitive resin composition, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN claimed
US-12607932-B2 Photosensitive composition and film prepared from the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2026-04-21 US disclosed
US-12584020-B2 Compound, photosensitive fluorescent resin composition comprising same, color conversion film prepared using same, backlight unit, and display device LG CHEM, LTD. (KR) 2026-03-24 US disclosed
US-12577263-B2 Compound and optical film comprising same LG CHEM, LTD. (KR) 2026-03-17 US disclosed
US-12577393-B2 Polymer resin compound, method for producing same, and photosensitive resin composition comprising same LG CHEM, LTD. (KR) 2026-03-17 US disclosed
EP-4067998-B1 EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) 2025-11-12 EP disclosed
US-20250333579-A1 COMPOSITION AND PACKAGE STRUCTURE INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2025-10-30 US disclosed
US-12384781-B2 Compound, photosensitive fluorescent resin composition comprising same, color conversion film manufactured therefrom, backlight unit, and display device LG CHEM, LTD. (KR) 2025-08-12 US disclosed
US-20250171664-A1 DOUBLE-SIDED ADHESIVE AND MULTILAYER STRUCTURE INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2025-05-29 US disclosed
US-7604921-B2 Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-10-20 US disclosed
WO-2009061159-A2 COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX LG CHEM. LTD. (KR) 2009-05-14 WO disclosed
WO-2009025498-A2 ALKALI DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM MANUFACTURED BY THE SAME LG CHEM, LTD. (KR) 2009-02-26 WO disclosed
WO-2008123661-A1 METHOD FOR MANUFACTURING COLOR FILTER AND COLOR FILTER MANUFACTURED BY USING THE SAME LG CHEM, LTD. (KR) 2008-10-16 WO disclosed
US-20080213514-A1 Obtained from a photosensitive resin composition comprising a 2,4-bis(trichloromethyl)-6-(p-substituted alkylthiophenyl) triazine photoiniator, an alkali-soluble photocurable binder, and a monomer such as dipentaerythritol hexaacrylate; high strength, sensitivity, residue characteristics, film uniformity LG CHEM, LTD. (KR) 2008-09-04 US disclosed
US-20080213514-A1 Obtained from a photosensitive resin composition comprising a 2,4-bis(trichloromethyl)-6-(p-substituted alkylthiophenyl) triazine photoiniator, an alkali-soluble photocurable binder, and a monomer such as dipentaerythritol hexaacrylate; high strength, sensitivity, residue characteristics, film uniformity LG CHEM, LTD. (KR) 2008-09-04 US disclosed
WO-2008102990-A1 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX LG CHEM, LTD. (KR) 2008-08-28 WO disclosed
WO-2008078953-A1 BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME LG CHEM, LTD. (KR) 2008-07-03 WO disclosed
US-20060073398-A1 Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-04-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12607932-B2 Photosensitive composition and film prepared from the same SETD2, SETD1B, DDT PRKAG1 3524/4885PRKAA2 4339/4885PRKAB1 3104/4885
US-12577393-B2 Polymer resin compound, method for producing same, and photosensitive resin composition comprising same RAD51, PSMB9, RNF168 PRKAG1 4388/4885PRKAA2 4832/4885PRKAB1 4261/4885
US-12584020-B2 Compound, photosensitive fluorescent resin composition comprising same, color conversion film prepared using same, backlight unit, and display device NR2E3, NR0B1, L1CAM PRKAG1 4738/4885PRKAA2 4794/4885PRKAB1 4541/4885
US-12384781-B2 Compound, photosensitive fluorescent resin composition comprising same, color conversion film manufactured therefrom, backlight unit, and display device NOTUM, THEM6, FAR1 PRKAG1 4638/4885PRKAA2 4697/4885PRKAB1 4613/4885
US-12577263-B2 Compound and optical film comprising same NR2E3, CBR1, CBR3 PRKAG1 4813/4885PRKAA2 4821/4885PRKAB1 4750/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.