SCHEMBL13596298

SCHEMBL13596298

O=C1CCOC1OC(=O)C1CC2CCC1C2

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.36
L3MBTL1 Q9Y468 2/20 0.35
HTT P42858 2/20 0.34
KDM4E B2RXH2 1/20 0.34
HPGD P15428 3/20 0.33
KCNQ3 O43525 1/20 0.33
KCNQ2 O43526 1/20 0.33
KCNQ4 P56696 1/20 0.33
KCNQ5 Q9NR82 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
GAA P10253 1/20 0.32
THRB P10828 1/20 0.32
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
HSD11B1 P28845 1/20 0.31
TSHR P16473 1/20 0.31
P2RX7 Q99572 1/20 0.31
HSD17B10 Q99714 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9908400 0.72 ALDH1A1 (0.43) POLBL3MBTL1KDM4EHPGDMEN1
SCHEMBL32689262 0.71 POLB (0.47) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL13596567 0.71 CHRM2 (0.37) POLBHTTKDM4EKMT2AGAA
SCHEMBL13325141 0.71 POLB (0.38) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL13867048 0.70 KDM4E (0.40) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL12228753 0.70 ATM (0.53) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL9908419 0.69 POLB (0.39) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL17070185 0.69 POLB (0.36) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL7647666 0.69 POLB (0.52) POLBL3MBTL1HTTKDM4EHPGD
SCHEMBL2515949 0.69 POLB (0.52) POLBL3MBTL1HTTKDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed