SCHEMBL13596606

SCHEMBL13596606

Cc1cccc(C(C)c2ccccc2O)c1O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.54
GABRA1 P14867 4/20 0.52
GABRB2 P47870 4/20 0.52
ALDH1A1 P00352 4/20 0.48
TSHR P16473 2/20 0.47
HPGD P15428 4/20 0.43
CYP3A4 P08684 3/20 0.43
CYP1A2 P05177 3/20 0.43
LMNA P02545 3/20 0.43
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
FAAH O00519 1/20 0.43
GABRB1 P18505 1/20 0.43
GABRG2 P18507 1/20 0.43
PTGS1 P23219 1/20 0.43
SLC6A2 P23975 1/20 0.43
HTR2C P28335 1/20 0.43
GABRB3 P28472 1/20 0.43
GABRA5 P31644 1/20 0.43
GABRA3 P34903 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL921042 0.90 ALDH1A1 (0.59) TRPA1GABRA1GABRB2ALDH1A1TSHR
SCHEMBL13220411 0.88 GABRA1 (0.60) TRPA1GABRA1GABRB2ALDH1A1TSHR
SCHEMBL6251589 0.86 GABRA1 (0.58) TRPA1GABRA1GABRB2ALDH1A1TSHR
SCHEMBL51565 0.83 GABRA1 (0.71) GABRA1GABRB2ALDH1A1TSHRHPGD
SCHEMBL29440398 0.83 GABRA1 (0.71) GABRA1GABRB2ALDH1A1TSHRHPGD
SCHEMBL836116 0.81 GABRA1 (0.52) TRPA1GABRA1GABRB2ALDH1A1TSHR
SCHEMBL4941262 0.81 HPGD (0.49) TRPA1GABRA1GABRB2ALDH1A1TSHR
SCHEMBL9327385 0.79 GABRA1 (0.50) GABRA1GABRB2ALDH1A1TSHRHPGD
SCHEMBL7786826 0.79 HPGD (0.54) TRPA1GABRA1GABRB2ALDH1A1TSHR
SCHEMBL6131382 0.78 TSHR (0.75) TRPA1GABRA1GABRB2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638253-B2 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-12-29 US disclosed
US-20080254634-A1 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same SAMSUNG ELECTRONICS CO., LTD. 2008-10-16 US disclosed