Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | PTGS1 | P23219 | 7/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 7/20 | 0.32 |
| ▸ | ALOX5 | P09917 | 5/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.32 |
| ▸ | G6PD | P11413 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | TTR | P02766 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL134940 | 0.98 | ACHE (0.44) | CA1CA2ACHEESR1ESR2 | |
| SCHEMBL4419486 | 0.87 | CA1 (0.34) | CA1CA2ACHECYP2C9ALDH1A1 | |
| SCHEMBL2742099 | 0.83 | EGFR (0.40) | CA1CA2PTGS1PTGS2ALOX5 | |
| Trifluoromethanesulfonic Acid SCHEMBL36229 | 0.82 | BRD4 (0.32) | CA1CA2ACHECYP2C9ALDH1A1 | |
| SCHEMBL11941645 | 0.81 | CA1 (0.39) | CA1CA2ACHEESR1ESR2 | |
| Trifluoromethanesulfonic Acid SCHEMBL36187 | 0.80 | ACHE (0.33) | ACHECYP2C9KMT2A | |
| SCHEMBL3870640 | 0.78 | CYTH2 (0.44) | ALDH1A1PTGS1PTGS2ALOX5GAA | |
| SCHEMBL2226534 | 0.77 | TP53 (0.45) | ESR1ESR2CYP2C9ALDH1A1CYP1A2 | |
| Water SCHEMBL9746094 | 0.75 | TP53 (0.43) | ESR1ESR2CYP2C9ALDH1A1CYP1A2 | |
| SCHEMBL7047390 | 0.74 | BRD4 (0.45) | ACHEALDH1A1PTGS1PTGS2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 479 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3345978-B1 | HYBRID ADHESIVE AND ITS USE | FISCHERWERKE GMBH & CO KG (DE) | 2020-06-03 | — | — | EP | claimed |
| EP-3164432-B1 | REACTIVE DILUENT FOR THE CHEMICAL ANCHORING | FISCHERWERKE GMBH & CO KG (DE) | 2020-05-13 | — | — | EP | claimed |
| EP-3313896-B1 | ALDIMINES AND KETIMINES AS INITIATORS IN HARDENER SYSTEMS AND CORRESPONDING RESIN COMPOSITIONS FOR USES INCLUDING FIXING TECHNOLOGY | FISCHERWERKE GMBH & CO KG (DE) | 2019-07-31 | — | — | EP | claimed |
| US-20170158560-A1 | REACTIVE DILUENTS FOR CHEMICAL FIXING | FISCHERWERKE GMBH & CO. KG (DE) | 2017-06-08 | — | — | US | claimed |
| EP-2985318-B1 | RADICALLY CURABLE SYNTHETIC RESIN COMPOSITION WITH OLIGOMERIC SILOXANE ADDITIVES. | FISCHERWERKE GMBH & CO KG (DE) | 2017-03-01 | — | — | EP | claimed |
| US-20120247985-A1 | FREE-RADICAL-POLYMERISABLE FIXING MORTAR HAVING SILANE ADDITIVES | FISCHERWERKE GMBH & CO. KG (DE) | 2012-10-04 | — | — | US | claimed |
| US-12332563-B2 | Pattern-forming method and composition | JSR CORPORATION (JP) | 2025-06-17 | — | — | US | disclosed |
| US-20250147418-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR CORPORATION (JP) | 2025-05-08 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| CN-119330866-A | A photoacid generator Photoresist composition comprising the same | 湖北鼎龙控股股份有限公司 | 2025-01-21 | — | — | CN | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118511127-A | Photosensitive resin composition, method for producing resist pattern film, and method for producing plating molded article | JSR株式会社 | 2024-08-16 | — | — | CN | disclosed |
| US-20230323008-A1 | SPECIAL IMINES AND THEIR STARTING MATERIALS, AND THEIR USE IN THE HARDENING OF REACTIVE RESINS BY POLYADDITION OR FREE-RADICAL POLYMERISATION | FISCHERWERKE GMBH & CO. KG (DE) | 2023-10-12 | — | — | US | disclosed |
| EP-1652866-A1 | ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2006-05-03 | — | — | EP | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1085379-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-01-04 | — | — | EP | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20040048192-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-03-11 | — | — | US | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230323008-A1 | SPECIAL IMINES AND THEIR STARTING MATERIALS, AND THEIR USE IN THE HARDENING OF REACTIVE RESINS BY POLYADDITION OR FREE-RADICAL POLYMERISATION | ICAM1, ITGAM, ITGA1 | CA1 2419/4885CA2 3635/4885ACHE 3611/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.