Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 12/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | PKM | P14618 | 1/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | USP2 | O75604 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | ADRB2 | P07550 | 2/20 | 0.44 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14827298 | 0.90 | KDM4E (0.60) | KDM4EKMT2AMEN1PKMALDH1A1 | |
| SCHEMBL13683054 | 0.83 | MAPT (0.48) | PKMSMN1; SMN2MAPT | |
| SCHEMBL13683026 | 0.83 | TDP1 (0.46) | KDM4EKMT2AMEN1PKMALDH1A1 | |
| SCHEMBL13683044 | 0.82 | L3MBTL1 (0.47) | KDM4EKMT2AMEN1PKMALDH1A1 | |
| SCHEMBL13683057 | 0.81 | PTGS2 (0.41) | KDM4EKMT2AMEN1ALDH1A1SMN1; SMN2 | |
| SCHEMBL13683055 | 0.80 | ALDH1A1 (0.53) | KDM4EKMT2AMEN1ALDH1A1SMN1; SMN2 | |
| SCHEMBL14827289 | 0.79 | KDM4E (0.44) | KDM4EKMT2AMEN1PKMALDH1A1 | |
| SCHEMBL13683063 | 0.79 | RXRA (0.46) | — | |
| SCHEMBL825432 | 0.78 | KDM4E (0.51) | KDM4EKMT2AMEN1PKMALDH1A1 | |
| SCHEMBL12159342 | 0.78 | RARB (0.52) | KDM4ESMN1; SMN2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |