SCHEMBL13683058

SCHEMBL13683058

CCC(C)(C)C(=O)OCCOCOc1ccc(-c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.46
MAPT P10636 2/20 0.46
LMNA P02545 1/20 0.46
CASP3 P42574 1/20 0.46
SENP8 Q96LD8 1/20 0.46
SENP7 Q9BQF6 1/20 0.46
SENP6 Q9GZR1 1/20 0.46
HDAC1 Q13547 11/20 0.44
HDAC2 Q92769 11/20 0.44
HDAC3 O15379 9/20 0.44
HDAC4 P56524 9/20 0.44
HDAC7 Q8WUI4 9/20 0.44
HDAC10 Q969S8 9/20 0.44
HDAC11 Q96DB2 9/20 0.44
HDAC8 Q9BY41 9/20 0.44
HDAC6 Q9UBN7 9/20 0.44
HDAC9 Q9UKV0 9/20 0.44
HDAC5 Q9UQL6 9/20 0.44
RAB9A P51151 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683041 0.92 TDP1 (0.44) NPC1HDAC1HDAC2RAB9ASMN1; SMN2
SCHEMBL12793181 0.91 HDAC1 (0.50) NPC1MAPTLMNACASP3SENP8
SCHEMBL13683056 0.90 HDAC1 (0.46) HDAC1HDAC2HDAC3HDAC4HDAC7
SCHEMBL13683037 0.85 MEN1 (0.47) NPC1MAPTLMNASMN1; SMN2
SCHEMBL13683046 0.85 CHRM2 (0.41) LMNASMN1; SMN2
SCHEMBL13683066 0.85 PPARG (0.47) NPC1MAPTHDAC1RAB9ASMN1; SMN2
SCHEMBL18219828 0.83 KDM4E (0.48) NPC1MAPTLMNAHDAC1HDAC2
SCHEMBL11306567 0.83 KDM4E (0.48) NPC1MAPTLMNAHDAC1HDAC2
SCHEMBL12900758 0.83 KDM4E (0.48) NPC1MAPTLMNAHDAC1HDAC2
SCHEMBL12900759 0.83 KDM4E (0.48) NPC1MAPTLMNAHDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed