SCHEMBL13683037

SCHEMBL13683037

CCC(C)(C)C(=O)OCCOCOc1ccc(C)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.43
PPARA Q07869 3/20 0.42
NPC1 O15118 1/20 0.38
PPARD Q03181 1/20 0.38
ALDH1A1 P00352 1/20 0.37
ATM Q13315 1/20 0.37
MAPT P10636 2/20 0.37
HPGD P15428 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
MAOB P27338 1/20 0.36
LMNA P02545 1/20 0.36
GAA P10253 1/20 0.36
PARP10 Q53GL7 1/20 0.35
ABCB11 O95342 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
TSHR P16473 1/20 0.35
HTR2A P28223 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683046 0.89 CHRM2 (0.41) ALDH1A1SMN1; SMN2LMNACYP1A2TSHR
SCHEMBL13683041 0.87 TDP1 (0.44) PPARANPC1SMN1; SMN2TSHR
SCHEMBL13683051 0.86 ELANE (0.40) KMT2AL3MBTL1PPARAALDH1A1MAPT
SCHEMBL13683039 0.85 L3MBTL1 (0.50) MEN1KMT2AL3MBTL1PPARAHPGD
SCHEMBL13683058 0.85 NPC1 (0.46) NPC1MAPTSMN1; SMN2LMNA
SCHEMBL10050669 0.83 PPARA (0.48) MEN1KMT2AL3MBTL1PPARANPC1
SCHEMBL13683066 0.83 PPARG (0.47) MEN1KMT2APPARANPC1PPARD
SCHEMBL13670118 0.82 PPARA (0.55) MEN1KMT2AL3MBTL1PPARAPPARD
SCHEMBL13683043 0.81 CHRNB2 (0.43) KMT2AL3MBTL1ALDH1A1CYP3A4TSHR
SCHEMBL13683036 0.80 TDP1 (0.48) MEN1KMT2AL3MBTL1NPC1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed