Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.50 |
| ▸ | TTR | P02766 | 3/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | PGR | P06401 | 1/20 | 0.46 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.46 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.46 |
| ▸ | CBR1 | P16152 | 1/20 | 0.46 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.46 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.46 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.46 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9493767 | 0.88 | TDP1 (0.50) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL4372626 | 0.85 | TDP1 (0.51) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL29892533 | 0.85 | TDP1 (0.51) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL10935492 | 0.84 | TDP1 (0.65) | TDP1HPGDNR1I2MAPTMEN1 | |
| SCHEMBL6330123 | 0.84 | TDP1 (0.47) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL11441578 | 0.84 | TDP1 (0.51) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL3235427 | 0.82 | TDP1 (0.49) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL4372630 | 0.82 | INPPL1 (0.52) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL11101053 | 0.82 | TDP1 (0.49) | TDP1TTRHPGDNR1I2LMNA | |
| SCHEMBL9494486 | 0.82 | TDP1 (0.49) | TDP1TTRHPGDNR1I2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8729260-B2 | Process for the preparation of carbapenem using cabapenem intermediates and recovery of cabapenem | SAVIOR LIFETEC CORPORATION (TW) | 2014-05-20 | — | — | US | claimed |
| US-20110288290-A1 | PROCESS FOR THE PREPARATION OF CARBAPENEM USING CABAPENEM INTERMEDIATES AND RECOVERY OF CABAPENEM | SAVIOR LIFETEC CORPORATION (TW) | 2011-11-24 | — | — | US | claimed |
| US-20110288289-A1 | Preparation of Carbapenem Intermediate and Their Use | SAVIOR LIFETEC CORPORATION (TW) | 2011-11-24 | — | — | US | claimed |
| EP-2388261-A2 | Improved process for the preparation of carbapenem using carbapenem intermediates and recovery of carbapenem | Savior Lifetec Corporation (TW) | 2011-11-23 | — | — | EP | claimed |
| US-D647009-S1 | Motor vehicle and/or toy replica thereof | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2011-10-18 | — | — | US | claimed |
| US-6863592-B2 | Chemical/mechanical polishing slurry and chemical mechanical polishing method using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-03-08 | — | — | US | claimed |
| US-20040033764-A1 | Chemical/mechanical polishing slurry and chemical mechanical polishing method using the same | SAMSUNG ELECTRONICS CO., LTD. | 2004-02-19 | — | — | US | claimed |
| US-20030148616-A1 | Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same | LEE JONG-WON (KR) | 2003-08-07 | — | — | US | claimed |
| US-6540935-B2 | Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-04-01 | — | — | US | claimed |
| US-20030022499-A1 | Chemical/mechanical polishing slurry, and chemical mechanical polishing process and shallow trench isolation process employing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-01-30 | — | — | US | claimed |
| US-5245069-A | Reacting a phosphoryl halide and a phenol in the presence of a dialkylaminopyridine and an arylphosphorodihalidate | MERCK & CO., INC. (US) | 1993-09-14 | — | — | US | claimed |
| EP-0429726-A1 | Process for 2-(aminoalkylthio)carbapenems | MERCK & CO. INC. (US) | 1991-06-05 | — | — | EP | claimed |
| US-4894450-A | FORMING AN ENOL PHOSPHATE INTERMEDIATE | MERCK & CO., INC. (US) | 1990-01-16 | — | — | US | claimed |
| US-4845261-A | Process for bis(substituted phenyl) phosphorohalidates | MERCK & CO., INC. (US) | 1989-07-04 | — | — | US | claimed |
| US-20260015372-A1 | Organophosphorous Compounds and Uses Thereof | JAL THERAPEUTICS LLC (US) | 2026-01-15 | — | — | US | disclosed |
| US-20250215264-A1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PREPARING SAME, AND CHEMICAL MECHANICAL POLISHING METHOD OF WAFER | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-07-03 | — | — | US | disclosed |
| US-20250043149-A1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING APPARATUS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-02-06 | — | — | US | disclosed |
| US-4845261-A | Process for bis(substituted phenyl) phosphorohalidates | MERCK & CO., INC. (US) | 1989-07-04 | — | — | US | disclosed |
| US-4820853-A | Process for the preparation of alkyl diaryl phosphites and diaryl halophosphates | AKZO AMERICA INC. (US) | 1989-04-11 | — | — | US | disclosed |
| WO-1988007046-A1 | PROCESS FOR THE PREPARATION OF ALKYL DIARYL PHOSPHITES AND DIARYL HALOPHOSPHATES | AKZO N.V. (NL) | 1988-09-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110288289-A1 | Preparation of Carbapenem Intermediate and Their Use | SI, MGAM, IDE | TDP1 4686/4885TTR 3333/4885HPGD 217/4885 |
| US-20110288290-A1 | PROCESS FOR THE PREPARATION OF CARBAPENEM USING CABAPENEM INTERMEDIATES AND RECOVERY OF CABAPENEM | MGAM, PMM2, PYGM | TDP1 4695/4885TTR 3834/4885HPGD 1435/4885 |
| US-20260015372-A1 | Organophosphorous Compounds and Uses Thereof | ACHE, BCHE, MUSK | TDP1 296/4885TTR 1236/4885HPGD 3786/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.