SCHEMBL13715837

SCHEMBL13715837

O=C(Nc1nnn[nH]1)Nc1ncccc1C(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ DHODH Q02127 5/20 0.48
▸ RAB9A P51151 7/20 0.45
▸ NPC1 O15118 5/20 0.45
▸ HTT P42858 2/20 0.45
▸ ATM Q13315 1/20 0.45
▸ SMN1; SMN2 Q16637 4/20 0.44
▸ MEN1 O00255 3/20 0.44
▸ KMT2A Q03164 3/20 0.44
▸ LMNA P02545 3/20 0.42
▸ GAA P10253 1/20 0.42
▸ KDM4E B2RXH2 4/20 0.41
▸ POLB P06746 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ NPSR1 Q6W5P4 3/20 0.41
▸ L3MBTL1 Q9Y468 3/20 0.41
▸ ALDH1A1 P00352 2/20 0.41
▸ MAPT P10636 2/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP2C9 P11712 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18640728 0.84 DHODH (0.64) DHODHRAB9ANPC1HTTATM
SCHEMBL13715917 0.80 CA1 (0.55) DHODHSMN1; SMN2MEN1KMT2ALMNA
SCHEMBL13715949 0.79 RAB9A (0.35) RAB9ANPC1HTTATMSMN1; SMN2
SCHEMBL13715947 0.78 KDM4E (0.41) RAB9ANPC1HTTATMSMN1; SMN2
SCHEMBL13715920 0.77 KDM4E (0.53) MEN1KMT2AGAAKDM4EPOLB
SCHEMBL12057465 0.75 MDM2 (0.33) —
SCHEMBL13715672 0.75 SMN1; SMN2 (0.57) RAB9ANPC1HTTATMSMN1; SMN2
SCHEMBL13715632 0.74 NPC1 (0.58) RAB9ANPC1SMN1; SMN2MEN1KMT2A
SCHEMBL8604699 0.74 DHODH (0.64) DHODHRAB9ANPC1HTTSMN1; SMN2
SCHEMBL11556569 0.72 KDM4E (0.40) SMN1; SMN2MEN1KMT2ALMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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