SCHEMBL13715917

SCHEMBL13715917

O=C(O)c1cccnc1C(=O)Nc1nnn[nH]1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 1/20 0.55
▸ CA2 P00918 1/20 0.55
▸ KDM4E B2RXH2 8/20 0.53
▸ ALDH1A1 P00352 5/20 0.53
▸ L3MBTL1 Q9Y468 2/20 0.53
▸ ALOX15 P16050 2/20 0.53
▸ NPSR1 Q6W5P4 2/20 0.53
▸ CYP3A4 P08684 1/20 0.53
▸ MAPT P10636 1/20 0.53
▸ TSHR P16473 1/20 0.53
▸ BLM P54132 1/20 0.53
▸ AGER Q15109 1/20 0.53
▸ PTPN1 P18031 1/20 0.45
▸ TDP1 Q9NUW8 1/20 0.42
▸ KMT2A Q03164 2/20 0.41
▸ MEN1 O00255 1/20 0.41
▸ NAPRT Q6XQN6 2/20 0.41
▸ LMNA P02545 1/20 0.41
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ GAA P10253 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13715920 0.89 KDM4E (0.53) CA1CA2KDM4EALDH1A1L3MBTL1
SCHEMBL10933803 0.82 GRM1 (0.42) CA1CA2KDM4EALDH1A1ALOX15
SCHEMBL10937760 0.82 KIT (0.45) KDM4EALDH1A1L3MBTL1NPSR1MAPT
SCHEMBL13715689 0.81 KDM4E (0.49) CA1CA2KDM4EALDH1A1L3MBTL1
SCHEMBL13715837 0.80 DHODH (0.48) KDM4EALDH1A1L3MBTL1ALOX15NPSR1
SCHEMBL11556569 0.79 KDM4E (0.40) KDM4EALDH1A1L3MBTL1ALOX15MAPT
SCHEMBL10933029 0.78 BRD4 (0.46) KDM4EALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL3279880 0.77 KDM4E (0.69) CA1CA2KDM4EALDH1A1L3MBTL1
SCHEMBL13715947 0.77 KDM4E (0.41) KDM4EALDH1A1L3MBTL1ALOX15NPSR1
SCHEMBL9501879 0.77 NPC1 (0.56) KDM4EALDH1A1L3MBTL1MAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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