SCHEMBL13715920

SCHEMBL13715920

O=C(Nc1nnn[nH]1)c1cccnc1C(=O)O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 12/20 0.53
▸ ALDH1A1 P00352 7/20 0.53
▸ L3MBTL1 Q9Y468 3/20 0.53
▸ MAPT P10636 3/20 0.53
▸ ALOX15 P16050 2/20 0.53
▸ CYP3A4 P08684 1/20 0.53
▸ TSHR P16473 1/20 0.53
▸ BLM P54132 1/20 0.53
▸ AGER Q15109 1/20 0.53
▸ NPSR1 Q6W5P4 1/20 0.53
▸ GAA P10253 3/20 0.50
▸ KMT2A Q03164 4/20 0.46
▸ CA1 P00915 1/20 0.43
▸ CA2 P00918 1/20 0.43
▸ MEN1 O00255 2/20 0.41
▸ PRKCI P41743 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.39
▸ ALPL P05186 2/20 0.39
▸ POLB P06746 1/20 0.39
▸ CYP1A2 P05177 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13715917 0.89 CA1 (0.55) KDM4EALDH1A1L3MBTL1MAPTALOX15
SCHEMBL13715689 0.81 KDM4E (0.49) KDM4EALDH1A1L3MBTL1MAPTALOX15
SCHEMBL13715947 0.80 KDM4E (0.41) KDM4EALDH1A1L3MBTL1MAPTALOX15
SCHEMBL9501879 0.80 NPC1 (0.56) KDM4EALDH1A1L3MBTL1MAPTKMT2A
SCHEMBL11556569 0.79 KDM4E (0.40) KDM4EALDH1A1L3MBTL1MAPTALOX15
SCHEMBL10937760 0.79 KIT (0.45) KDM4EALDH1A1L3MBTL1MAPTNPSR1
SCHEMBL10933803 0.79 GRM1 (0.42) KDM4EALDH1A1ALOX15GAAKMT2A
SCHEMBL13411752 0.78 ALPL (0.35) KDM4EALDH1A1L3MBTL1MAPTALOX15
SCHEMBL10792371 0.77 POLB (0.46) KDM4EALDH1A1MAPTTSHRNPSR1
SCHEMBL13715837 0.77 DHODH (0.48) KDM4EALDH1A1L3MBTL1MAPTALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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