SCHEMBL13715947

SCHEMBL13715947

O=C(Nc1nnn[nH]1)Nc1cccnc1C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 7/20 0.41
▸ ALDH1A1 P00352 5/20 0.41
▸ MAPT P10636 4/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ ALOX15 P16050 1/20 0.41
▸ TSHR P16473 1/20 0.41
▸ BLM P54132 1/20 0.41
▸ AGER Q15109 1/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ MEN1 O00255 4/20 0.40
▸ KMT2A Q03164 4/20 0.40
▸ SMN1; SMN2 Q16637 3/20 0.40
▸ HTT P42858 3/20 0.40
▸ RAB9A P51151 6/20 0.38
▸ NPC1 O15118 4/20 0.38
▸ LMNA P02545 1/20 0.38
▸ ATM Q13315 2/20 0.37
▸ HPGD P15428 1/20 0.37
▸ GFER P55789 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13715920 0.80 KDM4E (0.53) KDM4EALDH1A1MAPTCYP3A4ALOX15
SCHEMBL13715949 0.79 RAB9A (0.35) KDM4EALDH1A1MAPTCYP3A4ALOX15
SCHEMBL13715837 0.78 DHODH (0.48) KDM4EALDH1A1MAPTCYP3A4ALOX15
SCHEMBL13715917 0.77 CA1 (0.55) KDM4EALDH1A1MAPTCYP3A4ALOX15
SCHEMBL12057465 0.75 MDM2 (0.33) —
SCHEMBL13715672 0.75 SMN1; SMN2 (0.57) MAPTALOX15TSHRNPSR1L3MBTL1
SCHEMBL13715632 0.74 NPC1 (0.58) MAPTALOX15TSHRMEN1KMT2A
SCHEMBL23931860 0.74 KDM4E (0.55) KDM4EALDH1A1MAPTCYP3A4ALOX15
SCHEMBL13715689 0.74 KDM4E (0.49) KDM4EALDH1A1MAPTCYP3A4ALOX15
SCHEMBL31490031 0.73 KDM4E (0.53) KDM4EALDH1A1MAPTCYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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