SCHEMBL13715689

SCHEMBL13715689

O=C(O)c1nccnc1C(=O)Nc1nnn[nH]1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 6/20 0.49
▸ MAPT P10636 3/20 0.49
▸ ALDH1A1 P00352 2/20 0.49
▸ TSHR P16473 2/20 0.46
▸ ATM Q13315 1/20 0.46
▸ KMT2A Q03164 2/20 0.43
▸ ALOX15 P16050 2/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.41
▸ POLB P06746 1/20 0.39
▸ FABP4 P15090 1/20 0.37
▸ FABP5 Q01469 1/20 0.37
▸ ATR Q13535 1/20 0.36
▸ GLA P06280 1/20 0.36
▸ CA1 P00915 1/20 0.34
▸ CA2 P00918 1/20 0.34
▸ PRKCI P41743 2/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ BLM P54132 1/20 0.33
▸ AGER Q15109 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10593982 0.83 TDP1 (0.33) KDM4EMAPTALDH1A1TSHRATM
SCHEMBL10776251 0.83 KDM4E (0.38) KDM4EMAPTALDH1A1TSHRKMT2A
SCHEMBL13715920 0.81 KDM4E (0.53) KDM4EMAPTALDH1A1TSHRKMT2A
SCHEMBL13715917 0.81 CA1 (0.55) KDM4EMAPTALDH1A1TSHRKMT2A
SCHEMBL13715949 0.80 RAB9A (0.35) KDM4EMAPTALDH1A1TSHRATM
SCHEMBL10595043 0.77 PIM1 (0.41) MAPTALDH1A1TSHRKMT2AL3MBTL1
SCHEMBL10622776 0.77 GRM5 (0.35) KDM4EMAPTALDH1A1PRKCI
SCHEMBL10933803 0.76 GRM1 (0.42) KDM4EALDH1A1KMT2AALOX15CA1
SCHEMBL10937760 0.76 KIT (0.45) KDM4EMAPTALDH1A1ATMKMT2A
SCHEMBL13411744 0.75 MAPT (0.51) KDM4EMAPTALDH1A1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
US-20090203215-A1 METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD FUJIFILM CORPORATION (JP) 2009-08-13 — — US disclosed
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