SCHEMBL13770869

SCHEMBL13770869

O=C(OCC(O)CC(F)F)C1CC2C=CC1C2

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.44
RAB9A P51151 1/20 0.44
KMT2A Q03164 3/20 0.41
POLB P06746 3/20 0.40
HSD17B10 Q99714 2/20 0.40
APEX1 P27695 1/20 0.40
RECQL P46063 1/20 0.40
BLM P54132 1/20 0.40
ESR2 Q92731 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HPGD P15428 1/20 0.40
LMNA P02545 2/20 0.40
KDM4E B2RXH2 2/20 0.40
MAPK1 P28482 2/20 0.34
MAPT P10636 1/20 0.34
MEN1 O00255 1/20 0.33
ALOX15 P16050 1/20 0.33
TSHR P16473 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13744519 0.87 ALDH1A1 (0.51) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL7895172 0.86 ALDH1A1 (0.45) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL19498812 0.81 LMNA (0.47) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL3690168 0.80 ALDH1A1 (0.45) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL16998395 0.78 ALDH1A1 (0.46) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL948252 0.78 ALDH1A1 (0.46) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL10963486 0.77 ALDH1A1 (0.40) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL7742323 0.76 USP2 (0.43) ALDH1A1KMT2APOLBL3MBTL1LMNA
SCHEMBL25567661 0.75 ALDH1A1 (0.44) ALDH1A1RAB9AKMT2APOLBHSD17B10
SCHEMBL10388301 0.75 ALDH1A1 (0.53) ALDH1A1RAB9AKMT2APOLBHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8431323-B2 Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-30 US disclosed
EP-1652844-B1 Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process SHINETSU CHEMICAL CO (JP) 2009-07-01 EP disclosed