Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | ABCB1 | P08183 | 7/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2138395 | 0.81 | ATM (0.44) | SMN1; SMN2L3MBTL1GAAPOLBLMNA | |
| SCHEMBL7895172 | 0.78 | ALDH1A1 (0.45) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL13770869 | 0.76 | ALDH1A1 (0.44) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL19498812 | 0.75 | LMNA (0.47) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL3690168 | 0.74 | ALDH1A1 (0.45) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL13744519 | 0.73 | ALDH1A1 (0.51) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL948252 | 0.73 | ALDH1A1 (0.46) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL10963486 | 0.72 | ALDH1A1 (0.40) | L3MBTL1MAPK1POLBLMNATSHR | |
| SCHEMBL7742326 | 0.71 | ALDH1A1 (0.46) | L3MBTL1MAPK1POLBLMNAALDH1A1 | |
| SCHEMBL8961484 | 0.71 | LMNA (0.49) | SMN1; SMN2L3MBTL1MAPK1POLBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6426171-B1 | BICYCLIC PHOTORESIST MONOMER FOR POLYMER HAVING EXCELLENT ETCHING AND HEAT RESISTANCE AND ENHANCED POST EXPOSURE DELAY STABILITY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-07-30 | — | — | US | disclosed |