Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.35 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.35 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.35 |
| ▸ | DRD3 | P35462 | 1/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.35 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CTSK | P43235 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12163403 | 0.93 | ALDH1A1 (0.39) | ALDH1A1TDP1CYP3A4TSHRCA2 | |
| SCHEMBL4204484 | 0.84 | ALDH1A1 (0.41) | ALDH1A1TDP1CYP3A4TSHRCA2 | |
| SCHEMBL4890028 | 0.81 | CYP3A4 (0.50) | ALDH1A1TDP1CYP3A4TSHRCA2 | |
| SCHEMBL124322 | 0.77 | ALDH1A1 (0.49) | ALDH1A1TDP1CYP3A4TSHRCA2 | |
| SCHEMBL11812004 | 0.76 | EPHX1 (0.33) | — | |
| SCHEMBL9999632 | 0.74 | EPHX1 (0.32) | TSHR | |
| SCHEMBL28581771 | 0.73 | ALDH1A1 (0.33) | ALDH1A1TDP1CYP3A4TSHRCHRM2 | |
| SCHEMBL5945176 | 0.72 | TSHR (0.36) | TSHR | |
| SCHEMBL19105133 | 0.71 | ALDH1A1 (0.43) | ALDH1A1TDP1CYP3A4TSHRCA2 | |
| SCHEMBL28979410 | 0.71 | LMNA (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 244 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-3633455-B1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-3859447-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-12473403-B2 | Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor | FUJIFILM CORPORATION (JP) | 2025-11-18 | — | — | US | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-7267931-B2 | Process for producing optical waveguide | NITTO DENKO CORPORATION (JP) | 2007-09-11 | — | — | US | disclosed |
| US-7167629-B2 | Optical waveguide and production method thereof | NITTO DENKO CORPORATION (JP) | 2007-01-23 | — | — | US | disclosed |
| US-20060247401-A1 | Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing | SAN-APRO LIMITED (JP) | 2006-11-02 | — | — | US | disclosed |
| EP-1640363-A1 | PROCESS FOR PRODUCTION OF MONOSULFONIUM SALTS, CATIONIC POLYMERIZATION INITIATORS, CURABLE COMPOSITIONS, AND PRODUCTS OF CURING | San-Apro Limited (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20060029891-A1 | Process for producing optical waveguide | NITTO DENKO CORPORATION | 2006-02-09 | — | — | US | disclosed |
| EP-1624327-A1 | Process for producing optical waveguide | NITTO DENKO CORPORATION (JP) | 2006-02-08 | — | — | EP | disclosed |
| US-20050201714-A1 | Optical waveguide and production method thereof | NITTO DENKO CORPORATION (JP) | 2005-09-15 | — | — | US | disclosed |
| EP-1564565-A2 | Optical waveguide and production method thereof | NITTO DENKO CORPORATION (JP) | 2005-08-17 | — | — | EP | disclosed |
| US-6929863-B2 | Surface treatment of plastic material with an organic polymerizable and/or crosslinkable composition having reactive functions | RHODIA SERVICES (FR) | 2005-08-16 | — | — | US | disclosed |
| US-20030199661-A1 | Surface treatment of plastic material with an organic polymerisable and/or crosslinkable composition having reactive functions | RHODIA SERVICES (FR) | 2003-10-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | ALDH1A1 3706/4885TDP1 2545/4885CYP3A4 2409/4885 |
| US-20060247401-A1 | Process for production of monosulfonium salts, cationic polymerization initiators, curable compositions, and products of curing | RPS6, SPIN4, SRM | ALDH1A1 2558/4885TDP1 4430/4885CYP3A4 1123/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.