SCHEMBL13823613

SCHEMBL13823613

CCc1ccc(S(=O)(=O)Nc2ccccc2C(=O)O)cc1

nearest known ligand 0.75

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.75
▸ KDM4E B2RXH2 3/20 0.75
▸ METAP2 P50579 4/20 0.73
▸ KMT2A Q03164 5/20 0.63
▸ TSHR P16473 1/20 0.63
▸ MEN1 O00255 4/20 0.60
▸ POLB P06746 1/20 0.60
▸ LMNA P02545 4/20 0.60
▸ HSD17B10 Q99714 1/20 0.59
▸ WDR5 P61964 2/20 0.58
▸ GAA P10253 3/20 0.58
▸ HTT P42858 2/20 0.56
▸ TDP1 Q9NUW8 2/20 0.56
▸ TP53 P04637 2/20 0.56
▸ NPC1 O15118 1/20 0.56
▸ HPGD P15428 1/20 0.56
▸ SMN1; SMN2 Q16637 1/20 0.56
▸ L3MBTL1 Q9Y468 1/20 0.56
▸ KCNA5 P22460 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3558171 0.87 METAP2 (0.60) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL23200377 0.87 METAP2 (0.76) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL27777404 0.86 ALDH1A1 (0.75) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL23200374 0.85 METAP2 (0.70) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL1466906 0.85 ALDH1A1 (0.72) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL3979169 0.84 METAP2 (1.00) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL3557805 0.84 SLC16A3 (0.65) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL1688339 0.84 METAP2 (0.71) ALDH1A1KDM4EMETAP2KMT2ATSHR
SCHEMBL16127963 0.82 ALDH1A1 (0.69) ALDH1A1KDM4EMETAP2KMT2AMEN1
SCHEMBL16088722 0.81 CA12 (0.66) ALDH1A1KDM4EMETAP2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7547335-B2 Metal polishing composition and method of polishing using the same FUJIFILM CORPORATION (JP) 2009-06-16 — — US disclosed
US-20070287362-A1 POLISHING COMPOSITION AND METHOD OF POLISHING WITH THE SAME FUJIFILM CORPORATION 2007-12-13 — — US disclosed
Send feedback